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- %%%TITLE, AUTHORS AND ABSTRACT%%%
- \twocolumn[
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- \includegraphics{head_foot/DOI} & \noindent\LARGE{\textbf{Photogenerated Electron-Hole Plasma Induced Symmetry Breaking in Spherical Silicon Nanoparticle}} \\%Article title goes here instead of the text "This is the title"
- \vspace{0.3cm} & \vspace{0.3cm} \\
- & \noindent\large{Anton Rudenko,$^{\ast}$\textit{$^{a}$} Konstantin Ladutenko,\textit{$^{b}$} Sergey Makarov\textit{$^{b}$} and Tatiana E. Itina\textit{$^{a}$$^{b}$}
-
- \textit{$^{a}$~Laboratoire Hubert Curien, UMR CNRS 5516, University of Lyon/UJM, 42000, Saint-Etienne, France }
- \textit{$^{b}$~ITMO University, Kronverksiy pr. 49, Saint-Petersburg, Russia}
-
- } \\%Author names go here instead of "Full name", etc.
-
-
- \includegraphics{head_foot/dates}
- & \noindent\normalsize
- {The concept of nonlinear all-dielectric nanophotonics based on high
- refractive index (e.g., silicon) nanoparticles supporting magnetic
- optical response has recently emerged as a powerful tool for ultrafast
- all-optical modulation at nanoscale. A strong modulation can be
- achieved via photo-generation of dense electron-hole plasma in the
- regime of simultaneous excitation of electric and magnetic Mie
- resonances, resulting in an effective transient reconfiguration of
- nanoparticle scattering properties. However, only homogeneous plasma
- generation was previously considered in a photo-excited
- nanoparticle, remaining unexplored any effects related to the
- plasma-induced optical inhomogeneities. Here we examine these
- effects by using 3D numerical modeling of coupled electrodynamic and
- material ionization equations. Based on the simulation results, we
- observed a deeply subwavelength plasma-induced nanopatterning of
- spherical silicon nanoparticles. In particular, we revealed strong
- symmetry breaking in the initially symmetrical nanoparticle, which
- arises during ultrafast photoexcitation near the magnetic dipole
- resonance. The proposed ultrafast breaking of the nanoparticle
- symmetry paves the way to the novel opportunities for nonlinear
- optical nanodevices.}
- \end{tabular}
- \end{@twocolumnfalse} \vspace{0.6cm}
- ]%%%END OF TITLE, AUTHORS AND ABSTRACT%%%
- %%%FONT SETUP - please do not change any commands within this section
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- \section*{} \vspace{-1cm}
- %%%FOOTNOTES%%%
- \footnotetext{\textit{$^{a}$~Univ Lyon, UJM-St-Etienne, CNRS UMR 5516,
- F-42000, Saint-Etienne, France}} \footnotetext{\textit{$^{b}$~ITMO
- University, Kronverksiy pr. 49, St. Petersburg, Russia}}
- % Please use \dag to cite the ESI in the main text of the article.
- % If you article does not have ESI please remove the the \dag symbol
- % from the title and the footnotetext below.
- % \footnotetext{\dag~Electronic Supplementary Information (ESI)
- % available: [details of any supplementary information available
- % should be included here]. See DOI:10.1039/b000000x/} %additional
- % addresses can be cited as above using the lower-case letters, c, d,
- % e... If all authors are from the same address, no letter is required
- % \footnotetext{\ddag~Additional footnotes to the title and authors can
- % be included \emph{e.g.}\ `Present address:' or `These authors
- % contributed equally to this work' as above using the symbols: \ddag,
- % \textsection, and \P. Please place the appropriate symbol next to the
- % author's name and include a \texttt{\textbackslash footnotetext} entry
- % in the the correct place in the list.}
- %%%END OF FOOTNOTES%%%
- %%%MAIN TEXT%%%%
-
- \section{Introduction}
-
- All-dielectric nonlinear nanophotonics based on high refractive index
- dielectric materials has become prospective paradigm in modern optics, owing to
- recent advances in harmonics generation~\cite{shcherbakov2014enhanced,
- yang2015nonlinear, makarov2016self, shorokhov2016multifold,
- makarov2017efficient, makarov2017light} and ultrafast all-optical
- modulation~\cite{iyer2015reconfigurable, makarov2015tuning,
- shcherbakov2015ultrafast, yang2015nonlinear, baranov2016nonlinear,
- baranov2016tuning, shcherbakov2017ultrafast}. In fact,
- all-dielectric nanoantennas and metasurfaces possess much smaller
- parasitic Joule losses at high intensities as compared with their
- plasmonic counterparts, whereas their nonlinear properties are
- comparable. More importantly, the unique properties of nonlinear
- all-dielectric nanodevices are due to the existence of both electric and
- magnetic optical resonances in visible and near IR
- ranges~\cite{kuznetsov2016optically}. For instance, even slight
- variation of dielectric permittivity around optical resonances leads
- to significant changes in optical properties (transmittance or
- reflectance) of all-dielectric nanoantennas~\cite{makarov2015tuning,
- baranov2016nonlinear, baranov2016tuning} and
- metasurfaces~\cite{iyer2015reconfigurable, shcherbakov2015ultrafast,
- yang2015nonlinear, shcherbakov2017ultrafast}.
- \begin{figure}[t] \centering
- \includegraphics[width=0.75\linewidth]{Concept.pdf}
- \caption{Schematic illustration of electron-hole plasma 2D and 1D
- distributions in silicon nanoparticle around a magnetic resonance.}
- \label{fgr:concept}
- \end{figure}
- In previous works on all-dielectric nonlinear nanostructures, the
- building blocks (nanoparticles) were considered as objects with
- dielectric permittivity \textit{homogeneously} distributed over
- nanoparticle (NP). Therefore, in order to manipulate the propagation
- angle of the transmitted light it was proposed to use complicated
- nanostructures with reduced symmetry~\cite{albella2015switchable,
- baranov2016tuning, shibanuma2016unidirectional}. On the other hand,
- plasma explosion imaging technique~\cite{Hickstein2014} revealed
- \textit{in situ} strongly asymmetrical electron-hole plasma (EHP)
- distribution in various dielectric NPs during their pumping by
- femtosecond laser pulses. Therefore, local permittivity in the
- strongly photoexcited NPs can be significantly inhomogeneous, and
- symmetry of nanoparticles can be reduced.
- %The forward ejection of ions was attributed in this case to a nanolensing effect inside the NP and to intensity enhancement as low as $10\%$ on the far side of the NP. Much stronger enhancements can be achieved near electric and magnetic dipole resonances excited in single semiconductor NPs, such as silicon (Si), germanium (Ge) etc.
- In this Letter, we show theoretically that ultra-fast photo-excitation
- in a spherical silicon NP leads to a strongly inhomogeneous EHP
- distribution, as is shown schematically in Fig.~\ref{fgr:concept}. To
- reveal and analyze this effect, we perform a full-wave numerical
- simulation. We consider an intense femtosecond (\textit{fs}) laser
- pulse to interact with a silicon NP supporting Mie resonances and
- two-photon EHP generation. In particular, we couple finite-difference
- time-domain (FDTD) method used to solve three-dimensional Maxwell
- equations with kinetic equations describing nonlinear EHP generation.
- Three-dimensional transient variation of the material dielectric
- permittivity is calculated for NPs of several sizes. The obtained
- results propose a novel strategy to create complicated non-symmetrical
- nanostructures by using single photo-excited spherical silicon
- NPs. Moreover, we show that a dense EHP can be generated at deeply
- subwavelength scale ($< \lambda / 10$) supporting the formation of
- small metalized parts inside the NP. In fact, such effects transform a
- dielectric NP to a hybrid metall-dielectric one strongly extending
- functionality of the ultrafast optical nanoantennas.
- %Plan:
- %\begin{itemize}
- %\item Fig.3: Temporal evolution of EHP in NP with fixed diameter (at
- %MD) at different intensities, in order to show possible regimes of
- %plasma-patterning of NP volume. It would be nice, if we will show
- %power patterns decencies on intensity for side probe pulse to show beam steering due to symmetry breaking.
- %\item Fig.4: (a) Dependence on pulse duration is also interesting. We
- %have to show at which duration the asymmetry factor is saturated. (b)
- %2D map of asymmetry factor in false colors, where x-axis and y-axis correspond to intensity and NP diameter.
- %\end{itemize} %Additionally, if you will manage to calculate
- %evolution of scattering power pattern and show considerable effect of
- % beam steering, we can try Nanoscale or LPR, because the novelty will
- % be very high.
- \section{Modeling details}
- We focus attention on silicon because this material is promising for
- the implementation of numerous nonlinear photonic devices. This
- advantage is based on a broad range of optical nonlinearities, strong
- two-photon absorption, as well as a possibility of the photo-induced
- EHP excitation~\cite{leuthold2010nonlinear}. Furthermore, silicon
- nanoantennas demonstrate a sufficiently high damage threshold due to
- the high melting temperature ($\approx 1690$~K), whereas its nonlinear
- optical properties were extensively studied during the last
- decades~\cite{Van1987, Sokolowski2000, leuthold2010nonlinear}. High
- silicon melting point typically preserves structures formed from this
- material up to the EHP densities on the order of the critical value~\cite{Korfiatis2007}
- $N_{cr} \approx 5\cdot{10}^{21}$~cm$^{-3}$. At
- the critical density and above, silicon acquires metallic properties
- ($Re(\epsilon) < 0$) and contributes to the EHP reconfiguration during
- ultrashort laser irradiation.
- The process of three-dimensional photo-generation and temporal
- evolution of EHP in silicon NPs has not been modeled
- before. Therefore, herein we propose a model considering ultrashort
- laser interactions with a resonant silicon sphere, where the EHP is
- generated via one- and two-photon absorption processes. Importantly,
- we also consider nonlinear feedback of the material by taking into
- account the intraband light absorption on the generated free
- carriers. To simplify our model, we neglect free carrier diffusion due
- to the considered short time scales. In fact, the aim of the present
- work is to study the EHP dynamics \textit{during} ultra-short
- (\textit{fs}) laser interaction with the NP. The created electron-hole
- modifies both laser-particle interaction and, hence, the following
- particle evolution. However, the plasma then will recombine at
- picosecond time scale.
- \subsection{Light propagation}
- The incident wave propagates in positive direction of $z$ axis, the NP
- geometric center located at $z=0$ front side corresponds to the volume
- $z>0$ and back side for $z<0$, as shown in
- Fig.~\ref{fgr:concept}. Ultra-short laser interaction and light
- propagation inside the silicon NP are modeled by solving the system of
- three-dimensional Maxwell's equations written in the following way
- \begin{align} \begin{cases} \label{Maxwell}$$
- \displaystyle{\frac{\partial{\vec{E}}}{\partial{t}}=\frac{\nabla\times\vec{H}}{\epsilon_0\epsilon}-\frac{1}{\epsilon_0\epsilon}(\vec{J}_p+\vec{J}_{Kerr})} \\
- \displaystyle{\frac{\partial{\vec{H}}}{\partial{t}}=-\frac{\nabla\times\vec{E}}{\mu_0}},
- $$ \end{cases}
- \end{align}
- where $\vec{E}$ is the electric field, $\vec{H}$ is the magnetizing
- field, $\epsilon_0$ is the free space permittivity, $\mu_0$ is the
- permeability of free space, $\epsilon = n^2 = 3.681^2$ is the
- permittivity of non-excited silicon at $800$~nm wavelength
- \cite{Green1995}, $\vec{J}_p$ and $\vec{J}_{Kerr}$ are the nonlinear
- currents, which include the contribution due to Kerr effect
- $\vec{J}_{Kerr} =
- \epsilon_0\epsilon_\infty\chi_3\frac{\partial\left(\left|\vec{E}\right|^2\vec{E}\right)}{\partial{t}}$,
- where $\chi_3 =4\cdot{10}^{-20}$ m$^2$/V$^2$ for laser wavelength
- $\lambda = 800$~nm \cite{Bristow2007}, and heating of the conduction
- band, described by the differential equation derived from the Drude
- model
- \begin{equation} \label{Drude}
- \displaystyle{\frac{\partial{\vec{J_p}}}{\partial{t}} = -
- \nu_e\vec{J_p} + \frac{e^2N_e(t)}{m_e^*}\vec{E}},
- \end{equation}
- where $e$ is the elementary charge, $m_e^* = 0.18m_e$ is the reduced
- electron-hole mass \cite{Sokolowski2000}, $N_e(t)$ is the
- time-dependent free carrier density and $\nu_e = 10^{15}$~s$^{-1}$ is
- the electron collision frequency \cite{Sokolowski2000}. Silicon
- NP is surrounded by vacuum, where the light propagation is
- calculated by Maxwell's equations with $\vec{J} = 0$ and
- $\epsilon = 1$. The system of Maxwell's equations coupled with
- electron density equation is solved by the finite-difference numerical
- method \cite{Rudenko2016}, based on the finite-difference time-domain
- (FDTD) \cite{Yee1966} and auxiliary-differential methods for
- dispersive media \cite{Taflove1995}. At the edges of the grid, we
- apply the absorbing boundary conditions related to convolutional
- perfectly matched layers to avoid nonphysical reflections
- \cite{Roden2000}. The initial electric field is introduced as a
- Gaussian slightly focused beam as follows
- \begin{align}
- \begin{aligned}
- \label{Gaussian}
- {E_x}(t, r, z) = \frac{w_0}{w(z)}{exp}\left(i\omega{t} - \frac{r^2}{{w(z)}^2} - ikz - ik\frac{r^2}{2R(z)} + i\varsigma(z)\right)\\
- \times\;{exp}\left(-\frac{4\ln{2}(t-t_0)^2}{\theta^2}\right),
- \end{aligned}
- \end{align}
- where $\theta \approx 130$~\textit{fs} is the temporal pulse width at
- the half maximum (FWHM), $t_0$ is the time delay, $w_0 = 3{\mu}m$ is the
- beam waist, $w(z) = {w_0}\sqrt{1+(\frac{z}{z_R})^2}$ is the Gaussian's
- beam spot size, $\omega = 2{\pi}c/{\lambda}$ is the angular frequency,
- $\lambda = 800$~nm is the laser wavelength in air, $c$ is the speed of
- light, ${z_R} = \frac{\pi{{w_0}^2}n_0}{\lambda}$ is the Rayleigh
- length, $r = \sqrt{x^2 + y^2}$ is the radial distance from the beam's
- waist, $R_z = z\left(1+(\frac{z_R}{z})^2\right)$ is the radius of
- curvature of the wavelength comprising the beam, and
- $\varsigma(z) = {\arctan}(\frac{z}{z_R}) $ is the Gouy phase shift.
- \subsection{Material ionization}
- To account for the material ionization induced by a
- sufficiently intense laser field inside the particle, we couple
- Maxwell's equations with the kinetic equation for the electron-hole
- plasma as described below.
- The time-dependent conduction-band carrier density evolution is
- described by the rate equation proposed by van Driel
- \cite{Van1987}. This equation takes into account such processes as
- photoionization, avalanche ionization and Auger recombination, and is
- written as
- \begin{equation} \label{Dens}
- \displaystyle{\frac{\partial{N_e}}{\partial t} =
- \frac{N_a-N_e}{N_a}\left(\frac{\sigma_1I}{\hbar\omega} +
- \frac{\sigma_2I^2}{2\hbar\omega}\right) + \alpha{I}N _e -
- \frac{C\cdot{N_e}^3}{C\tau_{rec}N_e^2+1},} \end{equation} where
- $I=\frac{n}{2}\sqrt{\frac{\epsilon_0}{\mu_0}}\left|\vec{E}\right|^2$
- is the intensity, $\sigma_1 = 1.021\cdot{10}^3$~cm$^{-1}$ and
- $\sigma_2 = 0.1\cdot{10}^{-7}$~cm/W are the one-photon and two-photon
- interband cross-sections \cite{Choi2002, Bristow2007, Derrien2013},
- $N_a = 5\cdot{10}^{22}$~cm$^{-3}$ is the particle saturation density
- \cite{Derrien2013}, $C = 3.8\cdot{10}^{-31}$~cm$^6$/s is the Auger
- recombination rate \cite{Van1987}, $\tau_{rec} = 6\cdot{10}^{-12}$~s
- is the minimum Auger recombination time \cite{Yoffa1980}, and
- $\alpha = 21.2$~cm$^2$/J is the avalanche ionization coefficient
- \cite{Pronko1998} at the wavelength $800$~nm in air. As we have noted,
- free carrier diffusion is neglected during and shortly after the laser
- excitation \cite{Van1987, Sokolowski2000}. In particular, from the
- Einstein formula
- $D = k_B T_e \tau/m^* \approx (1$--$\,2)\cdot{10}^{-3}$ m$^2$/s ($k_B$
- is the Boltzmann constant, $T_e$ is the electron temperature,
- $\tau=1$~\textit{fs} is the collision time, $m^* = 0.18 m_e$ is the
- effective mass), where $T_e \approx 2*{10}^4$ K for $N_e$ close to
- $N_{cr}$ \cite{Ramer2014}. It means that during the pulse duration
- ($\approx 130$~\textit{fs}) the diffusion length will be around
- 10$\,$--15~nm for $N_e$ close to $N_{cr}$.
- \begin{figure}[ht!]
- \centering
- \includegraphics[width=0.495\textwidth]{mie-fdtd-3}
- \caption{\label{mie-fdtd} (a) First four Lorentz-Mie coefficients
- ($a_1$, $a_2$, $b_1$, $b_2$) and (b) factors of asymmetry $G_I$,
- $G_{I^2}$ according to the Mie theory at fixed wavelength
- $800$~nm. (c, d) Squared intensity distributions at different radii
- \textit{R} calculated by the Mie theory and (e, f) EHP distribution
- for low densities $N_e \approx 10^{20}$~cm$^{-3}$ by Maxwell's
- equations (\ref{Maxwell}, \ref{Drude}) coupled with EHP density
- equation (\ref{Dens}). (c-f) Incident
- light propagates from the left to the right along $Z$ axis, electric
- field polarization $\vec{E}$ is along $X$ axis.}
- \end{figure}
- The changes of the real and imaginary parts of the permittivity
- associated with the time-dependent free carrier response
- \cite{Sokolowski2000} can be derived from equations (\ref{Maxwell},
- \ref{Drude}) and are written as follows
- \begin{align} \begin{cases} \label{Index} $$
- \displaystyle{Re(\epsilon^\ast) = \epsilon -\frac{{e^2}N_e}{\epsilon_0m_e^*(\omega^2+{\nu_e}^2)}} \\
- \displaystyle{Im(\epsilon^\ast) = \frac{{e^2}N_e\nu_e}{\epsilon_0m_e^*\omega(\omega^2+{\nu_e}^2)}.}
- $$ \end{cases} \end{align}
- \subsection{Mie calculations}
- A steady-state interaction of a plain electromagnetic wave with a
- spherical particle has a well-known analytical solution described by a
- Mie theory~\cite{Bohren1983}. It is only valid in the absence of
- nonlinear optical response, thus we can compare it against
- above-mentioned FDTD-EHP model only for small plasma densities, where
- we can neglect EHP impact to the refractive index. Non-stationary
- nature of a~\textit{fs} pulse increases the complexity of the
- analysis. A detailed discussion on the relation between the Mie theory
- and FDTD-EHP model will be provided in the next section.
- We used the Scattnlay program to evaluate calculations of Lorentz-Mie
- coefficients ($a_i$, $b_i$) and near-field
- distribution~\cite{Ladutenko2017}. This program is available online at
- GitHub~\cite{Scattnlay-web} under open source license.
- \section{Results and discussion}
- \subsection{Asymmetry factors}
- \begin{figure*}[p]
- \centering
- \includegraphics[width=140mm]{time-evolution-I-no-NP.pdf}
- \caption{\label{time-evolution} Temporal EHP (a, c, e) and asymmetry
- factor $G_{N_e}$ (b, d, f) evolution for different Si nanoparticle
- radii of (a, b) $R = 75$~nm, (c, d) $R = 100$~nm, and (e, f)
- $R = 115$~nm. Pulse duration $130$~\textit{fs} (FWHM). Wavelength
- $800$~nm in air. (b, d, f) Different stages of EHP evolution shown
- in Fig.~\ref{plasma-grid} are indicated. The temporal evolution of
- Gaussian beam intensity is also shown. Peak laser intensity is
- fixed to be 10$^{12}$~W/cm$^2$. For better visual representation of
- time scale at a single optical cycle we put a squared electric
- field profile in all plots in Fig.~\ref{time-evolution} in gray
- color as a background image (note linear time scale on the left
- column and logarithmic scale on the right one).}
- \end{figure*}
-
- \begin{figure*}
- \centering
- \includegraphics[width=145mm]{plasma-grid.pdf}
- \caption{\label{plasma-grid} EHP density snapshots inside Si
- nanoparticle of radii $R = 75$~nm (a-d), $R = 100$~nm (e-h) and
- $R = 115$~nm (i-l) taken at different times and conditions of
- excitation (stages $1-4$: (1) first optical cycle, (2) maximum
- during few optical cycles, (3) quasi-stationary regime, (4)
- strongly nonlinear regime). $\Delta{Re(\epsilon)}$ indicates the
- real part change of the local permittivity defined by Equation
- (\ref{Index}). Pulse duration 130~\textit{fs} (FWHM). Wavelength 800~nm in
- air. Peak laser intensity is fixed to be 10$^{12}$~W/cm$^2$. }
- \end{figure*}
- %\subsection{Effect of the irradiation intensity on EHP generation}
- We start with a pure electromagnetic problem without EHP
- generation. We plot in Fig.~\ref{mie-fdtd}(a) Mie coefficients of a
- Si NP as a function of its size for a fixed laser wavelength
- $\lambda = 800$~nm. For the NP sizes under consideration most of
- contribution to the electromagnetic response originates from electric
- and magnetic dipole (ED and MD), while for sizes near
- $R \approx 150$~nm a magnetic quadrupole (MQ) response turns to be
- the main one. The superposition of multipoles defines the
- distribution of electric field inside the NP. We introduce $G_I$
- factor of asymmetry, corresponding to difference between the volume
- integral of squared electric field in the front side ($I^{front}$) of
- the NP to that in the back side ($I^{back}$) normalized to their sum:
- $G_I = (I^{front}-I^{back})/(I^{front}+I^{back})$, where
- $I^{front}=\int_{(z>0)}|E|^2d{\mathrm{v}}$ and
- $I^{back}=\int_{(z<0)} |E|^2d{\mathrm{v}}$ are expressed via
- amplitude of the electric field $|E|$. The factor $G_{I^2}$ was
- determined in a similar way by using volume integrals of squared
- intensity to predict EHP asymmetry due to two-photon absorption.
- Fig.~\ref{mie-fdtd}(b) shows $G$ factors as a function of the NP
- size. For the NPs of sizes below the first MD resonance, the
- intensity is enhanced in the front side as in Fig.~\ref{mie-fdtd}(c)
- and $G_I > 0$. The behavior changes near the size resonance value,
- corresponding to $R \approx 105$~nm. In contrast, for larger sizes,
- the intensity is enhanced in the back side of the NP as demonstrated
- in Fig.~\ref{mie-fdtd}(d). In fact, rather similar EHP distributions
- can be obtained by applying Maxwell's equations coupled with the rate
- equation for a relatively weak excitation with EHP concentration of
- $N_e \approx 10^{20}$~cm$^{-3}$, see Fig.~\ref{mie-fdtd}(e,f). The
- optical properties do not change considerably due to the excitation
- according to (\ref{Index}). Therefore, the excitation processes
- follow the intensity distribution. However, such coincidence was
- achieved under quasi-stationary conditions, after the electric field
- made enough oscillations inside the Si NP. Further on, we present
- transient analysis, which reveals much more details.
- To achieve a quantitative description for evolution of the EHP
- distribution during the \textit{fs} pulse, we introduced another
- asymmetry factor
- $G_{N_e} = (N_e^{front}-N_e^{back})/(N_e^{front}+N_e^{back})$
- indicating the relationship between the average EHP densities in the
- front and in the back halves of the NP, defined as
- $N_e^{front}=\frac{2}{V}\int_{(z>0)} {N_e}d{\mathrm{v}}$ and
- $N_e^{back}=\frac{2}{V}\int_{(z<0)} {N_e}d{\mathrm{v}}$, where
- $V = \frac{4}{3}\pi{R}^3$ is the volume of the nanosphere. In this
- way, $G_{N_e} = 0$ corresponds to the symmetrical case and the
- assumption of the NP homogeneous EHP distribution can be made to
- investigate the optical response of the excited Si NP. When $G_{N_e}$
- significantly differs from $0$, this assumption, however, could not
- be justified. In what follows, we discuss the results of the
- numerical modeling of the temporal evolution of EHP densities and the
- asymmetry factors $G_{N_e}$ for different sizes of Si NP, as shown in
- Fig.~\ref{time-evolution}). Typical change in permittivity
- corresponding to each stage is shown in Fig.~\ref{plasma-grid}. It
- reveals the EHP evolution stages during interaction of femtosecond
- laser pulse with the Si NPs.
-
- \subsection{Stages of transient Si nanoparticle photoexcitation}
- To describe all the stages of non-linear light interaction with Si
- NP, we present the calculation results obtained by using Maxwell's
- equations coupled with electron kinetics equations for different
- radii for resonant and non-resonant conditions at peak intensity
- 10$^{12}$~W/cm$^2$ and $\lambda = 800~nm$. In this case, the geometry
- of the EHP distribution can strongly deviate from the intensity
- distribution given by the Mie theory. Two main reasons cause the
- deviation: (i) non-stationarity of interaction between
- electromagnetic pulse and NP (ii) nonlinear effects, taking place due
- to transient optical changes in Si. The non-stationary intensity
- deposition during \textit{fs} pulse results in different time delays
- for exciting electric and magnetic resonances inside Si NP because of
- different quality factors $Q$ of the resonances. In particular, MD
- resonance (\textit{b1}) has $Q \approx 8$, whereas electric one
- (\textit{a1}) has $Q \approx 4$. The larger particle supporting MQ
- resonance (\textit{b2}) demonstrates $ Q \approx 40$. As soon as the
- electromagnetic wave period at $\lambda = 800$~nm is
- $\approx 2.7$~\textit{fs}, one needs about 10~\textit{fs} to pump the
- ED, 20~\textit{fs} for the MD, and about 100~\textit{fs} for the MQ.
- According to these considerations, after few optical cycles taking
- place on a 10~\textit{fs} scale it results in the excitation of the
- low-\textit{Q} ED resonance, which dominates MD and MQ independently
- on the exact size of NPs. Moreover, during the first optical cycle
- there is no multipole modes structure inside NP, which results in a
- very similar field distribution for all sizes of NP under
- consideration as shown in Fig.~\ref{plasma-grid}(a,e,i). We address
- to this phenomena as \textit{'Stage~1'}. This stage demonstrates the
- initial penetration of electromagnetic field into the NP during the
- first optical cycle. Resulting factors $G_{N_e}$ exhibit sharp
- increase at this stage (Fig.~\ref{time-evolution}(b,d,f), yielding
- strong and ultrafast symmetry breaking.
-
- \textit{'Stage~2'} corresponds to further electric field oscillations
- ($t \approx 5$--$15$~\textit{fs}) leading to the formation of ED E-field
- pattern in the center of the Si NP as shown in
- Fig.~\ref{plasma-grid}(f,j). We stress the nonstationary nature of
- E-field pattern at this stage, whereas there is a simultaneous growth
- of the incident pulse amplitude. This leads to a superposition of ED
- near-field pattern with that from Stage 1, resulting in EHP
- concentration in the front side of the Si NP. This effect dominates
- for the smallest NP with $R=75$~nm in Fig.~\ref{plasma-grid}(b),
- where ED mode is tuned far away from the resonance (see
- Fig.~\ref{mie-fdtd}(c) for field suppression inside NP predicted by
- the Mie theory). At this stage, the density of EHP
- ($N_e < 10^{20}$~cm$^2$) is still not high enough to significantly
- affect the optical properties of the NP
- (Figs.~\ref{time-evolution}(a,c,e)).
- When the number of optical cycles is large enough
- ($t>20$~\textit{fs}) both ED and MD modes can be exited to the level
- necessary to achieve the stationary intensity pattern corresponding
- to the Mie-based intensity distribution at \textit{'Stage~3'}
- (see Fig.~\ref{plasma-grid}(c,g,k)). The EHP density for the most
- volume of NP is still relatively small to affect the EHP evolution,
- but is already high enough to change the local optical properties,
- i.e. real part of permittivity. Below the MD resonance ($R = 75$~nm),
- the EHP is mostly localized in the front side of the NP as shown in
- Fig.~\ref{plasma-grid}(c). The highest quasi-stationary asymmetry
- factor $G_{N_e} \approx 0.5$--$0.6$ is achieved in this case
- (Fig~\ref{time-evolution}(b)). At the MD resonance conditions
- ($R = 100$~nm), the EHP distribution has a toroidal shape and is much
- closer to the homogeneous distribution. In contrast, above the MD
- resonant size for $R = 115$~nm the $G_{N_e} < 0$ due to the fact that
- EHP is dominantly localized in the back side of the NP.
- Diue to a quasi-stationary pumping during Stage~3,
- it is superposed with Stage~1 field pattern, resulting in an
- additional EHP localized in the front side. This can be seen when
- comparing result from the Mie theory in Fig.~\ref{mie-fdtd}(d) with
- that of full 3D simulation in Fig.~\ref{mie-fdtd}(f). Note that
- pumping of NP significantly changes during a single optical cycle,
- this leads to a large variation of asymmetry factor $G_{N_e}$ at the
- first stage. This variation steadily decreases as it goes to Stage~3,
- as shown in Fig.~\ref{time-evolution}(b,d,f).
- To explain this effect, we consider the time evolution of average EHP
- densities $N_e$ in the front and back halves of the NP presented in
- Fig.~\ref{time-evolution}(a,c,e). As soon as the recombination and
- diffusion processes are negligible at \textit{fs} time scale, both
- $N_e^{front}$ and $N_e^{back}$ curves experience monotonous behavior
- with small pumping steps synced to the incident pulse. The front and
- the back halves of NP are separated in space, which obviously leads
- to the presence of time delay between pumping steps in each curve
- caused by the same optical cycle of the incident wave. This delay
- causes a large asymmetry factor during the first stage. However, as soon
- as average EHP density increases, the relative contribution of these
- pumping steps to the resulting asymmetry becomes smaller. This way
- variations of asymmetry $G_{N_e}$ synced with the period of incident
- light decrease.
- Higher excitation conditions are followed by larger values of
- electric field amplitude, which leads to the appearance of high EHP
- densities causing a significant change in the optical properties of
- silicon according to the equations (\ref{Index}). From the Mie
- theory, the initial (at the end of Stage~3) spatial pattern of the
- optical properties is non-homogeneous. When non-homogeneity of the
- optical properties becomes strong enough it leads to the
- reconfiguration of the E-field inside NP, which in turn strongly
- affects further reconfiguration of the optical properties. We refer
- to these strong nonlinear phenomena as \textit{'Stage~4'}. In
- general, the reconfiguration of the electric field is unavoidable as
- far as the result from the Mie theory comes with the assumption of
- homogeneous optical properties in a spherical NP.
- Thus, the evolution of EHP density during Stage~4 depends on the
- result of multipole modes superposition at the end of Stage~3 and is
- quite different as we change the size of NP. For $R=75$~nm and
- $R=100$~nm, we observe a front side asymmetry before Stage~4,
- however, its origin is quite different. The $R=75$~nm NP is out
- of resonance, moreover, Mie field pattern and the one, which comes
- from Stage~1 are quite similar. As soon as EHP density becomes
- high enough to change optical properties, the NP is still out of
- resonance, however, the presence of EHP increases absorption in
- agreement with (\ref{Index}), decreases Q-factor, and destroys
- optical modes.
- % This effect effectively leads to a partial screening, and it
- % becomes harder for the incident wave to penetrate deeper into
- % EHP. Finally, this finishes spilling the NP`s volume with plasma
- % reducing the asymmetry, see Fig.~\ref{plasma-grid}(d).
-
- For $R=100$~nm, the evolution during the final stage goes in a
- similar way, with a notable exception regarding MD resonance. As
- soon as presence of EHP increases the absorption, it suppresses the
- MD resonance with symmetric filed pattern, thus, the asymmetry factor
- can be increased. This result was observed in
- Fig.~\ref{time-evolution}(d) with a local maximum near 100~\textit{fs}
- mark.
-
- The last NP with $R=115$~nm shows the most complex behavior during
- Stage~4. The superposition of Mie-like E-field pattern with that
- from Stage~1 results in the presence of two EHP spatial maxima, back
- and front shifted. They serve as starting seeds for the EHP
- formation, and an interplay between them forms a complex behavior of
- the asymmetry factor curve. Namely, the sign is changed from negative
- to positive and back during the last stage. This numerical result can
- hardly be explained in a simple qualitative manner, it is too complex
- to account all near-field interaction of incident light with two EHP
- regions inside a single NP. It is interesting to note, however, that
- in a similar way as it was for $R=100$~nm the increased absorption
- should destroy ED and MD resonances, which are responsible for the
- back-shifted EHP. As soon as this EHP region is quite visible on the
- last snapshot in Fig.~\ref{plasma-grid}(l), this means that EHP seeds
- are self-supporting.
-
- %A bookmark by Kostya
- As the EHP acquires quasi-metallic properties at stronger excitation
- $N_e > 5\cdot{10}^{21}$~cm$^{-3}$, the EHP distribution evolves
- inside NPs because of the photoionization and avalanche ionization
- induced transient optical response and the effect of newly formed
- EHP. This way, the distribution becomes more homogeneous and the
- effect is likely to be enhanced by electron diffusion inside Si
- NPs.
-
- It is worth noting that it is possible to achieve the formation of
- deeply subwavelength EHP regions due to high field localization. The
- smallest EHP localization and the larger asymmetry factor are
- achieved below the MD resonant conditions for $R < 100$~nm.
- Thus, the EHP distribution in Fig.~\ref{plasma-grid}(c) is optimal for
- symmetry breaking in Si NP, as it results in the larger asymmetry
- factor $G_{N_e}$ and higher electron densities $N_e$. We stress here
- that such regime could be still safe for NP due to the very small
- volume where such high EHP density is formed.
- % \subsection{Effects of NP size and scattering efficiency
- % factor on scattering directions}
- % \begin{figure}[ht] \centering
- % \includegraphics[width=90mm]{time-evolution.png}
- % \caption{\label{time-evolution} a) Scattering efficiency factor $Q_{sca}$
- % dependence on the radius $R$ of non-excited silicon NP
- % calculated by Mie theory; b) Parameter of forward/backward scattering
- % dependence on the radius $R$ calculated by Mie theory for non-excited
- % silicon NP c) Optimization parameter $K$ dependence on the
- % average electron density $n_e^{front}$ in the front half of the
- % NP for indicated radii (1-7).}
- % \end{figure}
- % We have discussed the EHP kinetics for a silicon NP of a
- % fixed radius $R \approx 105$~nm. In what follows, we investigate the
- % influence of the NP size on the EHP patterns and temporal
- % evolution during ultrashort laser irradiation. A brief analysis of
- % the initial intensity distribution inside the NP given by
- % the classical Mie theory for homogeneous spherical particles
- % \cite{Mie1908} can be useful in this case. Fig. \ref{time-evolution}(a, b)
- % shows the scattering efficiency and the asymmetry parameter for
- % forward/backward scattering for non-excited silicon NPs of
- % different radii calculated by Mie theory \cite{Mie1908}. Scattering
- % efficiency dependence gives us the value of resonant sizes of
- % NPs, where the initial electric fields are significantly
- % enhanced and, therefore, we can expect that the following conditions
- % will result in a stronger electron density gradients. Additionally,
- % in the case of maximum forward or backward scattering, the initial
- % intensity distribution has the maximum of asymmetry. One can note,
- % that for $R \approx 100$~nm and $R \approx 150$~nm both criteria are
- % fulfilled: the intensity is enhanced $5-10$ times due to
- % near-resonance conditions and its distribution has a strong
- % asymmetry.
- % In what follows, we present the calculation results obtained by
- % using Maxwell's equations coupled with electron kinetics for
- % different extremum radii for resonant and non-resonant
- % conditions. One can note, that the maximum asymmetry factor of EHP
- % $G$ does not guarantee the optimal asymmetry of intensity
- % distribution, as the size of generated plasma and the value of the
- % electron density equally contribute to the change of the modified
- % NP optical response. For example, it is easier to localize
- % high electron densities inside smaller NPs, however, due
- % to the negligible size of the generated EHP with respect to laser
- % wavelength in media, the intensity distribution around the
- % NP will not change considerably. Therefore, we propose to
- % introduce the optimization factor
- % $K = \frac{n_e(G-1)R^2}{n_{cr}G{R_0^2}}$, where $R_0 = 100$~nm,
- % $n_{cr} = 5\cdot{10}^{21}~cm^{-3}$, and $G$ is asymmetry of EHP,
- % defined previously. The calculation results for different radii of
- % silicon NPs and electron densities are presented in
- % Fig. \ref{time-evolution}(c). One can see, that the maximum value are achieved
- % for the NPs, that satisfy both initial maximum forward
- % scattering and not far from the first resonant condition. For larger
- % NPs, lower values of EHP asymmetry factor are obtained, as
- % the electron density evolves not only from the intensity patterns in
- % the front side of the NP but also in the back side.
- %TODO:
- %Need to discuss agreement/differences between Mie and FDTD+rate. Anton ?!
- % To demonstrate the effect of symmetry breaking, we calculate the
- % intensity distribution around the NP for double-pulse
- % experiment. The first pulse of larger pulse energy and polarization
- % along $Ox$ generates asymmetric EHP inside silicon NP,
- % whereas the second pulse of lower pulse energy and polarization $Oz$
- % interacts with EHP after the first pulse is gone. The minimum
- % relaxation time of high electron density in silicon is
- % $\tau_{rec} = 6\cdot{10}^{-12}$~s \cite{Yoffa1980}, therefore, the
- % electron density will not have time to decrease significantly for
- % subpicosecond pulse separations. In our simulations, we use
- % $\delta{t} = 200\:f\!s$ pulse separation. The intensity
- % distributions near the silicon NP of $R = 95$~nm,
- % corresponding to maxima value of $K$ optimization factor, without
- % plasma and with generated plasma are shown in Fig. \ref{fig4}. The
- % intensity distribution is strongly asymmetric in the case of EHP
- % presence. One can note, that the excited NP is out of
- % quasi-resonant condition and the intensity enhancements in
- % Fig. \ref{fig4}(c) are weaker than in Fig. \ref{fig4}(b). Therefore,
- % the generated nanoplasma acts like a quasi-metallic nonconcentric
- % nanoshell inside the NP, providing a symmetry reduction
- % \cite{Wang2006}.
- % \begin{figure}[ht] \centering
- % \includegraphics[width=90mm]{fig4.png}
- % \caption{\label{fig4} a) Electron plasma distribution inside Si
- % NP $R \approx 95$~nm 50~\textit{fs} after the pulse peak;
- % (Kostya: Is it scattering field intensity snapshot $XXX\:f\!s$ after
- % the second pulse maxima passed the particle?) Intensity
- % distributions around and inside the NP b) without plasma,
- % c) with electron plasma inside.}
- % \end{figure}
- %\begin{figure} %\centering
- % \includegraphics[height=0.7\linewidth]{Si-flow-R140-XYZ-Eabs}
- % \caption{EHP distributions for nonres., MD, ED, and MQ NPs
- % at moderate photoexcitation. The aim is to show different possible
- % EHP patterns and how strong could be symmetry breaking.
- % \label{fgr:example}
- %\end{figure}
- %\subsection{Asymmetry analysis: effects of pulse duration, intensity
- % and size} It is important to optimize asymmetry by varying pulse
- % duration, intensity and size.
- \section{Conclusions} We have rigorously modeled and studied
- ultra-fast and intense light interaction with a single silicon
- nanoparticle of various sizes for the first time to our best
- knowledge. As a result of the presented self-consistent nonlinear
- calculations, we have obtained spatio-temporal EHP evolution inside
- the NPs and investigated the asymmetry of the EHP distributions. We
- have revealed EHP strong asymmetric distribution during the first optical
- cycle for different sizes. The highest average EHP asymmetry has
- been observed for NPs of smaller sizes below the first magnetic
- dipole resonance, when EHP is concentrated in the front side mostly
- during the laser pulse absorption. Essentially different EHP
- evolution and lower asymmetry has been achieved for larger NPs due to
- the intensity enhancement in the back side of the NP. The EHP
- densities above the critical value have been shown to lead to
- homogenization of the EHP distribution. The observed plasma-induced
- breaking symmetry can be useful for creation of nonsymmetrical
- nanophotonic designes, e.g. for beam steering or enhanced second
- harmonics generation. Also, the asymmetric EHP opens a wide range of
- applications in NP nanomashining at deeply subwavelength scale.
- \section{Acknowledgments}
- A. R. and T. E. I. gratefully acknowledge the CINES of CNRS for
- computer support. S. V. M. is thankful to ITMO Fellowship
- Program. This work was partially supported by Russian Foundation for
- Basic Researches (grants 17-03-00621, 17-02-00538, 16-29-05317).
- %%%END OF MAIN TEXT%%%
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