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  105. %%%TITLE, AUTHORS AND ABSTRACT%%%
  106. \twocolumn[
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  111. \includegraphics{head_foot/DOI} & \noindent\LARGE{\textbf{Photogenerated Electron-Hole Plasma Induced Symmetry Breaking in Spherical Silicon Nanoparticle}} \\%Article title goes here instead of the text "This is the title"
  112. \vspace{0.3cm} & \vspace{0.3cm} \\
  113. & \noindent\large{Anton Rudenko,$^{\ast}$\textit{$^{a}$} Konstantin Ladutenko,\textit{$^{b}$} Sergey Makarov\textit{$^{b}$} and Tatiana E. Itina\textit{$^{a}$$^{b}$}
  114. \textit{$^{a}$~Laboratoire Hubert Curien, UMR CNRS 5516, University of Lyon/UJM, 42000, Saint-Etienne, France }
  115. \textit{$^{b}$~ITMO University, Kronverksiy pr. 49, St. Petersburg, Russia}
  116. } \\%Author names go here instead of "Full name", etc.
  117. \includegraphics{head_foot/dates}
  118. & \noindent\normalsize
  119. {The concept of nonlinear all-dielectric nanophotonics based on high
  120. refractive index (e.g., silicon) nanoparticles supporting magnetic
  121. optical response has recently emerged as a powerful tool for ultrafast
  122. all-optical modulation at nanoscale. A strong modulation can be
  123. achieved via photo-generation of dense electron-hole plasma in the
  124. regime of simultaneous excitation of electric and magnetic optical
  125. resonances, resulting in an effective transient reconfiguration of
  126. nanoparticle scattering properties. However, only homogeneous plasma
  127. generation was previously considered in the photo-excited
  128. nanoparticle, remaining unexplored any effects related to the
  129. plasma-induced optical inhomogeneities. Here we examine these
  130. effects by using 3D numerical modeling of coupled electrodynamic and
  131. material ionization equations. Based on the simulation results, we
  132. observed a deeply subwavelength plasma-induced nanopatterning of
  133. spherical silicon nanoparticles. In particular, we revealed strong
  134. symmetry breaking in the initially symmetrical nanoparticle, which
  135. arises during ultrafast photoexcitation near the magnetic dipole
  136. resonance. The proposed ultrafast breaking of the nanoparticle
  137. symmetry paves the way to the novel opportunities for nonlinear
  138. optical nanodevices.}
  139. \end{tabular}
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  141. ]%%%END OF TITLE, AUTHORS AND ABSTRACT%%%
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  144. \section*{} \vspace{-1cm}
  145. %%%FOOTNOTES%%%
  146. \footnotetext{\textit{$^{a}$~Univ Lyon, UJM-St-Etienne, CNRS UMR 5516,
  147. F-42000, Saint-Etienne, France}} \footnotetext{\textit{$^{b}$~ITMO
  148. University, Kronverksiy pr. 49, St. Petersburg, Russia}}
  149. % Please use \dag to cite the ESI in the main text of the article.
  150. % If you article does not have ESI please remove the the \dag symbol
  151. % from the title and the footnotetext below.
  152. % \footnotetext{\dag~Electronic Supplementary Information (ESI)
  153. % available: [details of any supplementary information available
  154. % should be included here]. See DOI:10.1039/b000000x/} %additional
  155. % addresses can be cited as above using the lower-case letters, c, d,
  156. % e... If all authors are from the same address, no letter is required
  157. % \footnotetext{\ddag~Additional footnotes to the title and authors can
  158. % be included \emph{e.g.}\ `Present address:' or `These authors
  159. % contributed equally to this work' as above using the symbols: \ddag,
  160. % \textsection, and \P. Please place the appropriate symbol next to the
  161. % author's name and include a \texttt{\textbackslash footnotetext} entry
  162. % in the the correct place in the list.}
  163. %%%END OF FOOTNOTES%%%
  164. %%%MAIN TEXT%%%%
  165. \section{Introduction}
  166. All-dielectric nonlinear nanophotonics based on high refractive index
  167. dielectric has become prospective paradigm in modern optics, owing to
  168. recent advances in harmonics generation~\cite{shcherbakov2014enhanced,
  169. yang2015nonlinear, makarov2016self, shorokhov2016multifold,
  170. makarov2017efficient} and ultrafast all-optical
  171. modulation~\cite{iyer2015reconfigurable, makarov2015tuning,
  172. shcherbakov2015ultrafast, yang2015nonlinear, baranov2016nonlinear,
  173. baranov2016tuning, shcherbakov2017ultrafast}. In fact,
  174. all-dielectric nanoantennas and metasurfaces possess much smaller
  175. parasitic Joule losses at high intensities as compared with their
  176. plasmonic counterparts, whereas their nonlinear properties are
  177. comparable. More importantly, the unique properties of the nonlinear
  178. all-dielectric nanodevices are due to existing of both electric and
  179. magnetic optical resonances in visible and near IR
  180. ranges~\cite{kuznetsov2016optically}. For instance, even slight
  181. variation of dielectric permittivity around optical resonances leads
  182. to significant changes of optical properties (transmittance or
  183. reflectance) of all-dielectric nanoantennas~\cite{makarov2015tuning,
  184. baranov2016nonlinear, baranov2016tuning} and
  185. metasurfaces~\cite{iyer2015reconfigurable, shcherbakov2015ultrafast,
  186. yang2015nonlinear, shcherbakov2017ultrafast, makarov2017light}.
  187. In these works on all-dielectric nonlinear nanostructures, the
  188. building blocks (nanoparticles) were considered as objects with
  189. dielectric permittivity \textit{homogeneously} distributed over
  190. nanoparticle (NP). Therefore, in order to manipulate the propagation
  191. angle of the transmitted light it was proposed to use complicated
  192. nanostructures with reduced symmetry~\cite{albella2015switchable,
  193. baranov2016tuning, shibanuma2016unidirectional}.
  194. \begin{figure}[t] \centering
  195. \includegraphics[width=0.75\linewidth]{Concept.pdf}
  196. \caption{Schematic illustration of electron-hole plasma 2D and 1D
  197. distributions in silicon nanoparticle around a magnetic resonance.}
  198. \label{fgr:concept}
  199. \end{figure}
  200. Recently, plasma explosion imaging technique has been used to
  201. observe electron-hole plasma (EHP), produced by femtosecond lasers,
  202. inside NPs~\cite{Hickstein2014}. Particularly, a strongly
  203. localized EHP in the front side\footnote{The incident wave propagates
  204. in positive direction of $z$ axis. For the NP with
  205. geometric center located at $z=0$ front side corresponds to the
  206. volume $z>0$ and back side for $z<0$} of NaCl nanocrystals of
  207. $R = 100$~nm was revealed. The forward ejection of ions in this case
  208. was attributed to a nanolensing effect inside the NP and the
  209. intensity enhancement as low as $10\%$ on the far side of the
  210. NP. Much stronger enhancements can be achieved near electric
  211. and magnetic dipole resonances excited in single semiconductor
  212. NPs, such as silicon (Si), germanium (Ge) etc.
  213. In this Letter, we show that ultra-short laser-based EHP
  214. photo-excitation in a spherical semiconductor (e.g., silicon) NP leads
  215. to a strongly inhomogeneous carrier distribution. To reveal and study
  216. this effect, we perform a full-wave numerical simulation. We consider
  217. an intense femtosecond (\textit{fs}) laser pulse to interact with a
  218. silicon NP supporting Mie resonances and two-photon free carrier
  219. generation. In particular, we couple finite-difference time-domain
  220. (FDTD) method used to solve three-dimensional Maxwell equations with
  221. kinetic equations describing nonlinear EHP generation.
  222. Three-dimensional transient variation of the material dielectric
  223. permittivity is calculated for NPs of several sizes. The obtained
  224. results propose a novel strategy to create complicated non-symmetrical
  225. nanostructures by using single photo-excited spherical silicon
  226. NPs. Moreover, we show that a dense EHP can be generated at deeply
  227. subwavelength scale ($< \lambda / 10$) supporting the formation of
  228. small metalized parts inside the NP. In fact, such effects transform
  229. an all-dielectric NP to a hybrid metall-dielectric one strongly
  230. extending functionality of the ultrafast optical nanoantennas.
  231. %Plan:
  232. %\begin{itemize}
  233. %\item Fig.3: Temporal evolution of EHP in NP with fixed diameter (at
  234. %MD) at different intensities, in order to show possible regimes of
  235. %plasma-patterning of NP volume. It would be nice, if we will show
  236. %power patterns decencies on intensity for side probe pulse to show beam steering due to symmetry breaking.
  237. %\item Fig.4: (a) Dependence on pulse duration is also interesting. We
  238. %have to show at which duration the asymmetry factor is saturated. (b)
  239. %2D map of asymmetry factor in false colors, where x-axis and y-axis correspond to intensity and NP diameter.
  240. %\end{itemize} %Additionally, if you will manage to calculate
  241. %evolution of scattering power pattern and show considerable effect of
  242. % beam steering, we can try Nanoscale or LPR, because the novelty will
  243. % be very high.
  244. \section{Modeling details}
  245. We focus attention on silicon because this material is promising for
  246. the implementation of numerous nonlinear photonic devices. This
  247. advantage is based on a broad range of optical nonlinearities, strong
  248. two-photon absorption, as well as a possibility of the photo-induced
  249. EHP excitation~\cite{leuthold2010nonlinear}. Furthermore, silicon
  250. nanoantennas demonstrate a sufficiently high damage threshold due to
  251. the large melting temperature ($\approx 1690$~K), whereas its nonlinear
  252. optical properties have been extensively studied during last
  253. decays~\cite{Van1987, Sokolowski2000, leuthold2010nonlinear}. High
  254. silicon melting point typically preserves structures formed from this
  255. material up to the EHP densities on the order of the critical value
  256. $N_{cr} \approx 5\cdot{10}^{21}$~cm$^{-3}$ \cite{Korfiatis2007}. At
  257. the critical density and above, silicon acquires metallic properties
  258. ($Re(\epsilon) < 0$) and contributes to the EHP reconfiguration during
  259. ultrashort laser irradiation.
  260. The process of three-dimensional photo-generation of the EHP in
  261. silicon NPs has not been modeled before in time-domain. Therefore,
  262. herein we propose a model considering ultrashort laser interactions
  263. with a resonant silicon sphere, where the EHP is generated via one-
  264. and two-photon absorption processes. Importantly, we also consider
  265. nonlinear feedback of the material by taking into account the
  266. intraband light absorption on the generated free carriers. To simplify
  267. our model, we neglect free carrier diffusion due to the considered
  268. short time scales. In fact, the aim of the present work is to study
  269. the EHP dynamics \textit{during} ultra-short (\textit{fs}) laser
  270. interaction with the NP. The created electron-hole modifies both
  271. laser-particle interaction and, hence, the following particle
  272. evolution. However, the plasma then will recombine at picosecond time
  273. scale.
  274. \subsection{Light propagation}
  275. Ultra-short laser interaction and light propagation inside the silicon
  276. NP are modeled by solving the system of three-dimensional Maxwell's equations
  277. written in the following way
  278. \begin{align} \begin{cases} \label{Maxwell}$$
  279. \displaystyle{\frac{\partial{\vec{E}}}{\partial{t}}=\frac{\nabla\times\vec{H}}{\epsilon_0\epsilon}-\frac{1}{\epsilon_0\epsilon}(\vec{J}_p+\vec{J}_{Kerr})} \\
  280. \displaystyle{\frac{\partial{\vec{H}}}{\partial{t}}=-\frac{\nabla\times\vec{E}}{\mu_0}},
  281. $$ \end{cases}
  282. \end{align}
  283. where $\vec{E}$ is the electric field, $\vec{H}$ is the magnetizing
  284. field, $\epsilon_0$ is the free space permittivity, $\mu_0$ is the
  285. permeability of free space, $\epsilon = n^2 = 3.681^2$ is the
  286. permittivity of non-excited silicon at $800$~nm wavelength
  287. \cite{Green1995}, $\vec{J}_p$ and $\vec{J}_{Kerr}$ are the nonlinear
  288. currents, which include the contribution due to Kerr effect
  289. $\vec{J}_{Kerr} =
  290. \epsilon_0\epsilon_\infty\chi_3\frac{\partial\left(\left|\vec{E}\right|^2\vec{E}\right)}{\partial{t}}$,
  291. where $\chi_3 =4\cdot{10}^{-20}$ m$^2$/V$^2$ for laser wavelength
  292. $\lambda = 800$~nm \cite{Bristow2007}, and heating of the conduction
  293. band, described by the differential equation derived from the Drude
  294. model
  295. \begin{equation} \label{Drude}
  296. \displaystyle{\frac{\partial{\vec{J_p}}}{\partial{t}} = -
  297. \nu_e\vec{J_p} + \frac{e^2N_e(t)}{m_e^*}\vec{E}},
  298. \end{equation}
  299. where $e$ is the elementary charge, $m_e^* = 0.18m_e$ is the reduced
  300. electron-hole mass \cite{Sokolowski2000}, $N_e(t)$ is the
  301. time-dependent free carrier density and $\nu_e = 10^{15}$~s$^{-1}$ is
  302. the electron collision frequency \cite{Sokolowski2000}. Silicon
  303. NP is surrounded by vacuum, where the light propagation is
  304. calculated by Maxwell's equations with $\vec{J} = 0$ and
  305. $\epsilon = 1$. The system of Maxwell's equations coupled with
  306. electron density equation is solved by the finite-difference numerical
  307. method \cite{Rudenko2016}, based on the finite-difference time-domain
  308. (FDTD) \cite{Yee1966} and auxiliary-differential methods for
  309. dispersive media \cite{Taflove1995}. At the edges of the grid, we
  310. apply the absorbing boundary conditions related to convolutional
  311. perfectly matched layers (CPML) to avoid nonphysical reflections
  312. \cite{Roden2000}. The initial electric field is introduced as a
  313. Gaussian slightly focused beam as follows
  314. \begin{align}
  315. \begin{aligned}
  316. \label{Gaussian}
  317. {E_x}(t, r, z) = \frac{w_0}{w(z)}{exp}\left(i\omega{t} - \frac{r^2}{{w(z)}^2} - ikz - ik\frac{r^2}{2R(z)} + i\varsigma(z)\right)\\
  318. \times\;{exp}\left(-\frac{4\ln{2}(t-t_0)^2}{\theta^2}\right),
  319. \end{aligned}
  320. \end{align}
  321. where $\theta \approx 130$~\textit{fs} is the temporal pulse width at the half maximum (FWHM),
  322. $t_0$ is a time delay, $w_0 = 3{\mu}m$ is the waist beam,
  323. $w(z) = {w_0}\sqrt{1+(\frac{z}{z_R})^2}$ is the Gaussian's beam spot
  324. size, $\omega = 2{\pi}c/{\lambda}$ is the angular frequency,
  325. $\lambda = 800$~nm is the laser wavelength in air, $c$ is the speed of
  326. light, ${z_R} = \frac{\pi{{w_0}^2}n_0}{\lambda}$ is the Rayleigh
  327. length, $r = \sqrt{x^2 + y^2}$ is the radial distance from the beam's
  328. waist, $R_z = z\left(1+(\frac{z_R}{z})^2\right)$ is the radius of
  329. curvature of the wavelength comprising the beam, and
  330. $\varsigma(z) = {\arctan}(\frac{z}{z_R}) $ is the Gouy phase shift.
  331. \subsection{Material ionization}
  332. To account for the material ionization that is induced by a
  333. sufficiently intense laser field inside the particle, we couple
  334. Maxwell's equations with the kinetic equation for the electron-hole
  335. plasma as described below.
  336. The time-dependent conduction-band carrier density evolution is
  337. described by a rate equation that was proposed by van Driel
  338. \cite{Van1987}. This equation takes into account such processes as
  339. photoionization, avalanche ionization and Auger recombination, and is
  340. written as
  341. \begin{equation} \label{Dens}
  342. \displaystyle{\frac{\partial{N_e}}{\partial t} =
  343. \frac{N_a-N_e}{N_a}\left(\frac{\sigma_1I}{\hbar\omega} +
  344. \frac{\sigma_2I^2}{2\hbar\omega}\right) + \alpha{I}N _e -
  345. \frac{C\cdot{N_e}^3}{C\tau_{rec}N_e^2+1},} \end{equation} where
  346. $I=\frac{n}{2}\sqrt{\frac{\epsilon_0}{\mu_0}}\left|\vec{E}\right|^2$
  347. is the intensity, $\sigma_1 = 1.021\cdot{10}^3$~cm$^{-1}$ and
  348. $\sigma_2 = 0.1\cdot{10}^{-7}$~cm/W are the one-photon and two-photon
  349. interband cross-sections \cite{Choi2002, Bristow2007, Derrien2013},
  350. $N_a = 5\cdot{10}^{22}$~cm$^{-3}$ is the saturation particle density
  351. \cite{Derrien2013}, $C = 3.8\cdot{10}^{-31}$~cm$^6$/s is the Auger
  352. recombination rate \cite{Van1987}, $\tau_{rec} = 6\cdot{10}^{-12}$~s is
  353. the minimum Auger recombination time \cite{Yoffa1980}, and
  354. $\alpha = 21.2$~cm$^2$/J is the avalanche ionization coefficient
  355. \cite{Pronko1998} at the wavelength $800$~nm in air. As we have noted,
  356. free carrier diffusion is neglected during and shortly after the laser
  357. excitation \cite{Van1987, Sokolowski2000}. In particular, from the
  358. Einstein formula $D = k_B T_e \tau/m^* \approx (1$--$\,2)\cdot{10}^{-3}$ m$^2$/s
  359. ($k_B$ is the Boltzmann constant, $T_e$ is the electron temperature,
  360. $\tau=1$~\textit{fs} is the collision time, $m^* = 0.18 m_e$ is the effective
  361. mass), where $T_e \approx 2*{10}^4$ K for $N_e$ close to $N_{cr}$ \cite{Ramer2014}. It
  362. means that during the pulse duration ($\approx 130$~\textit{fs}) the diffusion
  363. length will be around 10$\,$--15~nm for $N_e$ close to $N_{cr}$.
  364. \begin{figure}[ht!]
  365. \centering
  366. \includegraphics[width=0.495\textwidth]{mie-fdtd-3}
  367. \caption{\label{mie-fdtd} (a, b) First four Lorentz-Mie coefficients
  368. ($a_1$, $a_2$, $b_1$, $b_2$) and factors of asymmetry $G_I$,
  369. $G_{I^2}$ according to Mie theory at fixed wavelength $800$~nm. (c,
  370. d) Squared intensity distribution calculated by Mie theory and (e,
  371. f) EHP distribution for low free carrier densities
  372. $N_e \approx 10^{20}$~cm$^{-3}$ by Maxwell's equations
  373. (\ref{Maxwell}, \ref{Drude}) coupled with EHP density equation
  374. (\ref{Dens}). (c-f) Incident light propagates from the left to the
  375. right along $Z$ axis, electric field polarization $\vec{E}$ is along
  376. $X$ axis.}
  377. \end{figure}
  378. The changes of the real and imaginary parts of the permittivity
  379. associated with the time-dependent free carrier response
  380. \cite{Sokolowski2000} can be derived from equations (\ref{Maxwell},
  381. \ref{Drude}) and are written as follows
  382. \begin{align} \begin{cases} \label{Index} $$
  383. \displaystyle{Re(\epsilon^\ast) = \epsilon -\frac{{e^2}N_e}{\epsilon_0m_e^*(\omega^2+{\nu_e}^2)}} \\
  384. \displaystyle{Im(\epsilon^\ast) = \frac{{e^2}N_e\nu_e}{\epsilon_0m_e^*\omega(\omega^2+{\nu_e}^2)}.}
  385. $$ \end{cases} \end{align}
  386. \subsection{Mie calculations}
  387. A steady-state interaction of a plain electromagnetic wave with a
  388. spherical particle has a well-known analytical solution described by a
  389. Mie theory~\cite{Bohren1983}. It is only valid in the absence of
  390. nonlinear optical response, thus we can compare it against
  391. above-mentioned FDTD-EHP model only for small plasma densities, where
  392. we can neglect EHP impact to the refractive index. Non-stationary
  393. nature of a femtosecond pulse increase the complexity of the
  394. analysis. A detailed discussion on the relation between Mie theory and
  395. FDTD-EHP model will be provided in the next section.
  396. We used Scattnlay program to evaluate calculations of Mie coefficients
  397. and near-field distribution~\cite{Ladutenko2017}. This program is
  398. available online at GitHub~\cite{Scattnlay-web} under open source
  399. license.
  400. \section{Results and discussion}
  401. \begin{figure*}[p]
  402. \centering
  403. \includegraphics[width=145mm]{time-evolution-I-no-NP.pdf}
  404. \caption{\label{time-evolution} Temporal EHP (a, c, e) and asymmetry
  405. factor $G_{N_e}$ (b, d, f) evolution for different Si nanoparticle
  406. radii of (a, b) $R = 75$~nm, (c, d) $R = 100$~nm, and (e, f)
  407. $R = 115$~nm. Pulse duration $130$~\textit{fs} (FWHM). Wavelength
  408. $800$~nm in air. (b, d, f) Different stages of EHP evolution shown
  409. in Fig.~\ref{plasma-grid} are indicated. The temporal evolution of
  410. Gaussian beam intensity is also shown. Peak laser fluence is fixed
  411. to be $0.125$~J/cm$^2$.}
  412. \vspace*{\floatsep}
  413. \centering
  414. \includegraphics[width=150mm]{plasma-grid.pdf}
  415. \caption{\label{plasma-grid} EHP density snapshots inside Si nanoparticle of
  416. radii $R = 75$~nm (a-d), $R = 100$~nm (e-h) and $R = 115$~nm (i-l)
  417. taken at different times and conditions of excitation (stages
  418. $1-4$: (1) first optical cycle, (2) extremum at few optical cycles,
  419. (3) Mie theory, (4) nonlinear effects). $\Delta{Re(\epsilon)}$
  420. indicates the real part change of the dielectric function defined
  421. by Equation (\ref{Index}). Pulse duration $130$~\textit{fs}
  422. (FWHM). Wavelength $800$~nm in air. Peak laser fluence is fixed to
  423. be $0.125$~J/cm$^2$.}
  424. \end{figure*}
  425. %\subsection{Effect of the irradiation intensity on EHP generation}
  426. We start with a pure electromagnetic problem without EHP
  427. generation. We plot in Fig.~\ref{mie-fdtd}(a) Mie coefficients of a
  428. Si NP as a function of its size for a fixed laser wavelength
  429. $\lambda = 800$~nm. For the NP sizes under consideration most of
  430. contribution to the electromagnetic response originates from electric
  431. and magnetic dipole (ED and MD), while for sizes near
  432. $R \approx 150$~nm a magnetic quadrupole (MQ) response turns to be
  433. the main one. The superposition of multipoles defines the
  434. distribution of electric field inside of the NP. We introduce $G_I$
  435. factor of asymmetry, corresponding to difference between the volume
  436. integral of intensity in the front side of the NP to that in the back
  437. side normalized to their sum:
  438. $G_I = (I^{front}-I^{back})/(I^{front}+I^{back})$, where
  439. $I^{front}=\int_{(z>0)}|E|^2d{\mathrm{v}}$ and
  440. $I^{back}=\int_{(z<0)} |E|^2d{\mathrm{v}}$ are expressed via
  441. amplitude of the electric field $|E|$. The factor $G_{I^2}$ was
  442. determined in a similar way by using volume integrals of squared
  443. intensity to predict EHP asymmetry due to two-photon absorption.
  444. Fig.~\ref{mie-fdtd}(b) shows $G$ factors as a function of the NP
  445. size. For the NPs of sizes below the first MD resonance,
  446. the intensity is enhanced in the front side as in
  447. Fig.~\ref{mie-fdtd}(c) and $G_I > 0$. The behavior changes near the
  448. size resonance value, corresponding to $R \approx 105$~nm. In
  449. contrast, for larger sizes, the intensity is enhanced in the back
  450. side of the NP as demonstrated in Fig.~\ref{mie-fdtd}(d). In fact,
  451. rather similar EHP distributions can be obtained by applying Maxwell's
  452. equations coupled with the rate equation for relatively weak
  453. excitation with EHP concentration of $N_e \approx 10^{20}$~cm$^{-3}$,
  454. see Fig.~\ref{mie-fdtd}(e,f). The optical properties do not change
  455. considerably due to the excitation according to
  456. (\ref{Index}). Therefore, the excitation processes follow the
  457. intensity distribution. However, such coincidence was achieved under
  458. quasi-stationary conditions, after the electric field made enough
  459. oscillations inside the Si NP. Further on we present transient
  460. analysis, which reveals much more details.
  461. To achieve a quantative description for evolution of the EHP
  462. distribution during the \textit{fs} pulse, we introduced another
  463. asymmetry factor
  464. $G_{N_e} = (N_e^{front}-N_e^{back})/(N_e^{front}+N_e^{back})$
  465. indicating the relationship between the average EHP densities in the
  466. front and in the back halfs of the NP. This way, $G_{N_e} = 0$
  467. corresponds to the quasi-homogeneous case and the assumption of the
  468. NP homogeneous EHP distribution can be made to investigate the
  469. optical response of the excited Si NP. When $G_{N_e}$ significantly
  470. differs from $0$, this assumption, however, could not be
  471. justified. In what follows, we discuss the results of the numerical
  472. modeling (see Fig.~\ref{time-evolution}) of the temporal evolution of
  473. EHP densities and the asymmetry factor $G_{N_e}$. It reveals the EHP
  474. evolution stages during pulse duration. Typical change of the
  475. permittivity corresponding to each stage is shown in
  476. Fig.~\ref{plasma-grid}. For better visual representation of time
  477. scale of a single optical cycle we put a
  478. squared electric field profile on all plots in
  479. Fig.~\ref{time-evolution} in gray color as a backgroud image (note
  480. linear time scale on the left column and logarithmic scale on the
  481. right one).
  482. To describe all the stages of light non-linear interaction with Si
  483. NP, we present the calculation results obtained by using Maxwell's
  484. equations coupled with electron kinetics equations for different
  485. radii for resonant and non-resonant conditions. In this case, the
  486. geometry of the EHP distribution can strongly deviate from the
  487. intensity distribution given by Mie theory. Two main reasons cause
  488. the deviation: (i) non-stationarity of interaction between
  489. electromagnetic pulse and NP (ii) nonlinear effects, taking place due
  490. to transient optical changes in Si. The non-stationary intensity
  491. deposition during \textit{fs} pulse results in different time delays
  492. for exciting electric and magnetic resonances inside Si NP because of
  493. different quality factors $Q$ of the resonances.
  494. In particular, MD resonance (\textit{b1}) has $Q \approx 8$, whereas
  495. electric one (\textit{a1}) has $Q \approx 4$. The larger particle
  496. supporting MQ resonance (\textit{b2}) demonstrates $ Q \approx
  497. 40$. As soon as the electromagnetic wave period at $\lambda = 800$~nm
  498. is $\approx 2.7$~\textit{fs}, one needs about 10~\textit{fs} to pump the ED,
  499. 20~\textit{fs} for the MD, and about 100~\textit{fs} for the MQ.
  500. According to these considerations, after few optical cycles taking
  501. place on a 10~\textit{fs} scale it results in the excitation of the
  502. low-\textit{Q} ED resonance, which dominates MD and MQ independently
  503. on the exact size of NPs. Moreover, during the first optical cycle
  504. there is no multipole modes structure inside of NP, which results
  505. into a very similar field distribution for all sizes of NP under
  506. consideration as shown in Fig.~\ref{plasma-grid}(a,e,i) . We address
  507. to this phenomena as \textit{'Stage~1'}. This stage demonstrates the
  508. initial penetration of electromagnetic field into the NP during the
  509. first optical cycle.
  510. \textit{'Stage~2'} corresponds to further electric field oscillations
  511. ($t \approx 5$--$15$) leading to the formation of ED field pattern in
  512. the center of the NP as it can be seen in
  513. Fig.~\ref{plasma-grid}(f,j). We would like to stress the
  514. unstationery nature of field pattern at this stage. The energy
  515. balance between extinction and pumping is not set, moreover, there is
  516. a simultaneous growth of the incident pulse apmlitude. This leads to
  517. a superposition of ED field pattern with the one from the Stage 1,
  518. resulting into the presence for the maximum of the EHP distribution
  519. in the front side of the Si NP. This effect dominates for the
  520. smallest NP with $R=75$~nm in Fig.~\ref{plasma-grid}(b), where ED
  521. mode is tuned far away from the resonance (see Fig.~\ref{mie-fdtd}(c)
  522. for field supression inside of NP predicted by Mie theory). At this
  523. stage, the density of EHP ($N_e < 10^{20}$~cm$^2$) is still not high
  524. enough to significantly affect the optical properties of the NP.
  525. When the number of optical cycles is big enough ($t>20$~\textit{fs})
  526. both ED and MD modes can be exited to the level necessary to achieve
  527. the stationary intensity pattern corresponding to the Mie-based
  528. intensity distribution at the \textit{'Stage~3'} (see
  529. Fig.~\ref{plasma-grid}). The EHP density for the most volume of NP is
  530. still relatively small to affect the EHP evolution,
  531. but is already high enough to change the local optical
  532. properties. Below the MD resonance ($R = 75$~nm), the EHP is
  533. mostly localized in the front side of the NP as shown in
  534. Fig.~\ref{plasma-grid}(c). The highest quasi-stationary asymmetry factor
  535. $G_{N_e} \approx 0.5$--$0.6$ is achieved in this case. At the MD
  536. resonance conditions, the EHP distribution has a toroidal shape and
  537. is much closer to the homogeneous distribution. In contrast, above
  538. the MD resonant size for $R = 115$~nm the $G_{N_e} < 0$ due to
  539. the fact that EHP is dominantly localized in the back side of the NP.
  540. Once again, due to presence of continous pumping the Stage~3 is
  541. superposed with Stage~1 field pattern, resulting in the additional
  542. EHP localized in the front side. This can be seen when comparing
  543. result from the Mie theory in Fig.~\ref{mie-fdtd}(d) and result of
  544. full 3D simulation in Fig.~\ref{mie-fdtd}(f). Note that pumping of NP
  545. significantly changes during a single optical cycle, this leads to a
  546. large variation of asymmetry factor $G_{N_e}$ at first stage. This
  547. variation stedialy decrease as it goes to Stage~3.
  548. The explain this we need to consider time evolution of mean EHP
  549. densities $N_e$ in the front and back halfs of NP presented in
  550. Fig.~\ref{time-evolution}(a,c,e). As soon as recombination and
  551. diffusion processes are negligible at \textit{fs} time scale, both
  552. $N_e^{front}$ and $N_e^{back}$ curves experience monotonous behaviour
  553. with small pumping steps synced to the incident pulse. Front and back
  554. halfs are separated in space, wich obviously leads to the presence of
  555. time delay between puping steps in each curve caused with the same
  556. optical cycle of the incident wave. This delay causes a large value
  557. of the assymetry factor during first stage. However, as soon as mean
  558. EHP density increases the contribution of this pumping steps to
  559. resulting assymetry becomes smallar and the synced with the period of
  560. incident light variation of $G_{N_e}$ decreases.
  561. %A bookmark by Kostya
  562. Higher excitation conditions are followed with large values of
  563. electric field amplitude, which lead to apperance of high EHP
  564. densities causing a significant change of optical properties of
  565. silicon according to the equations (\ref{Index}). As it follows from
  566. Mie theory the initial (at the end of Stage~3) space pattern of
  567. optical properties is non-homogeneous. When non-homogeneity of
  568. optical properties becomes strong enougth it leads to the
  569. reconfiguration of the electric field inside of NP and vice versa. We
  570. refer to these strong nonlinear phenomena as \textit{'Stage~4'}. In
  571. general the reconfiguration of the electric field is obligatory as
  572. far as the result from the Mie theory comes with the assumption of
  573. homogeneous optical properties in a spherical NP.
  574. This way evolution of EHP density during Stage~4 depends on the
  575. result of multipole modes superposition in the end of Stage~3 and is
  576. quite different as we change the size of NP. For $R=75$~nm and
  577. $R=100$~nm we observe a front side asymmetry before Stage~4, however,
  578. the origin of it is quite different. The $R=75$~nm NP is out of
  579. resonance, moreover, Mie field pattern and the one which comes from
  580. Stage~1 are quite similar. As soon as EHP density becomes high enough
  581. to change optical properties the NP is still out of resonanse,
  582. however, presence of EHP increases absorption in accordance with
  583. (\ref{Index}). This effectively leads to a kind of screening, it
  584. becomes harder for incident wave to penetrate deep into EHP. Finally,
  585. this finishes spilling the NP`s volume with plasma reducing the
  586. asymmetry, see Fig.~\ref{plasma-grid}(d).
  587. For $R=100$~nm the evolution to during the final stage goes in a
  588. similar way, with a notable exception regarding MD resonance. As
  589. soon as presence of EHP incresases the absorption, it suppresses the
  590. MD resonance with symmetric filed pattern, thus, the asymmetry factor
  591. can be increased. This was actualy observed in
  592. Fig.~\ref{time-evolution}(d) with a local maxima near 100~\textit{fs}
  593. mark.
  594. The last NP with $R=115$~nm shows the most complex behavior during
  595. the Stage~4.
  596. as a result, the we observe the forward shifting of
  597. EHP density maximum. Therefore, EHP is localized in the front part of
  598. the NP, influencing the asymmetry factor $G_{N_e}$ in
  599. Fig.~\ref{time-evolution}. Approximately at the pulse peak, the
  600. critical electron density $N_{cr} = 5\cdot{10}^{21}$~cm$^{-3}$ for
  601. silicon, which corresponds to the transition to quasi-metallic state
  602. $Re(\epsilon) \approx 0$ and to the electron plasma resonance, is
  603. overcome. Further irradiation leads to a decrease in the asymmetry
  604. parameter down to $G_{N_e} = 0$ for higher EHP densities, as one can
  605. observe in Fig.~\ref{plasma-grid}(d, h, l).
  606. As the EHP acquires quasi-metallic properties at stronger excitation
  607. $N_e > 5\cdot{10}^{21}$~cm$^{-3}$, the EHP distribution evolves
  608. inside NPs because of the photoionization and avalanche ionization
  609. induced transient optical response and the effect of newly formed
  610. EHP. This way, the distribution becomes more homogeneous and the
  611. effect is likely to be enhanced by electron diffusion inside Si
  612. NPs.
  613. It is worth noting that it is possible to achieve a formation of
  614. deeply subwavelength EHP regions due to high field localization. The
  615. smallest EHP localization and the larger asymmetry factor are
  616. achieved below the MD resonant conditions for $R < 100$~nm.
  617. Thus, the EHP distribution in Fig.~\ref{plasma-grid}(c) is optimal for
  618. symmetry breaking in Si NP, as it results in the larger asymmetry
  619. factor $G_{N_e}$ and higher electron densities $N_e$. We stress here
  620. that such regime could be still safe for NP due to the very small
  621. volume where such high EHP density is formed.
  622. % \subsection{Effects of NP size and scattering efficiency
  623. % factor on scattering directions}
  624. % \begin{figure}[ht] \centering
  625. % \includegraphics[width=90mm]{time-evolution.png}
  626. % \caption{\label{time-evolution} a) Scattering efficiency factor $Q_{sca}$
  627. % dependence on the radius $R$ of non-excited silicon NP
  628. % calculated by Mie theory; b) Parameter of forward/backward scattering
  629. % dependence on the radius $R$ calculated by Mie theory for non-excited
  630. % silicon NP c) Optimization parameter $K$ dependence on the
  631. % average electron density $n_e^{front}$ in the front half of the
  632. % NP for indicated radii (1-7).}
  633. % \end{figure}
  634. % We have discussed the EHP kinetics for a silicon NP of a
  635. % fixed radius $R \approx 105$~nm. In what follows, we investigate the
  636. % influence of the NP size on the EHP patterns and temporal
  637. % evolution during ultrashort laser irradiation. A brief analysis of
  638. % the initial intensity distribution inside the NP given by
  639. % the classical Mie theory for homogeneous spherical particles
  640. % \cite{Mie1908} can be useful in this case. Fig. \ref{time-evolution}(a, b)
  641. % shows the scattering efficiency and the asymmetry parameter for
  642. % forward/backward scattering for non-excited silicon NPs of
  643. % different radii calculated by Mie theory \cite{Mie1908}. Scattering
  644. % efficiency dependence gives us the value of resonant sizes of
  645. % NPs, where the initial electric fields are significantly
  646. % enhanced and, therefore, we can expect that the following conditions
  647. % will result in a stronger electron density gradients. Additionally,
  648. % in the case of maximum forward or backward scattering, the initial
  649. % intensity distribution has the maximum of asymmetry. One can note,
  650. % that for $R \approx 100$~nm and $R \approx 150$~nm both criteria are
  651. % fulfilled: the intensity is enhanced $5-10$ times due to
  652. % near-resonance conditions and its distribution has a strong
  653. % asymmetry.
  654. % In what follows, we present the calculation results obtained by
  655. % using Maxwell's equations coupled with electron kinetics for
  656. % different extremum radii for resonant and non-resonant
  657. % conditions. One can note, that the maximum asymmetry factor of EHP
  658. % $G$ does not guarantee the optimal asymmetry of intensity
  659. % distribution, as the size of generated plasma and the value of the
  660. % electron density equally contribute to the change of the modified
  661. % NP optical response. For example, it is easier to localize
  662. % high electron densities inside smaller NPs, however, due
  663. % to the negligible size of the generated EHP with respect to laser
  664. % wavelength in media, the intensity distribution around the
  665. % NP will not change considerably. Therefore, we propose to
  666. % introduce the optimization factor
  667. % $K = \frac{n_e(G-1)R^2}{n_{cr}G{R_0^2}}$, where $R_0 = 100$~nm,
  668. % $n_{cr} = 5\cdot{10}^{21}~cm^{-3}$, and $G$ is asymmetry of EHP,
  669. % defined previously. The calculation results for different radii of
  670. % silicon NPs and electron densities are presented in
  671. % Fig. \ref{time-evolution}(c). One can see, that the maximum value are achieved
  672. % for the NPs, that satisfy both initial maximum forward
  673. % scattering and not far from the first resonant condition. For larger
  674. % NPs, lower values of EHP asymmetry factor are obtained, as
  675. % the electron density evolves not only from the intensity patterns in
  676. % the front side of the NP but also in the back side.
  677. %TODO:
  678. %Need to discuss agreement/differences between Mie and FDTD+rate. Anton ?!
  679. % To demonstrate the effect of symmetry breaking, we calculate the
  680. % intensity distribution around the NP for double-pulse
  681. % experiment. The first pulse of larger pulse energy and polarization
  682. % along $Ox$ generates asymmetric EHP inside silicon NP,
  683. % whereas the second pulse of lower pulse energy and polarization $Oz$
  684. % interacts with EHP after the first pulse is gone. The minimum
  685. % relaxation time of high electron density in silicon is
  686. % $\tau_{rec} = 6\cdot{10}^{-12}$~s \cite{Yoffa1980}, therefore, the
  687. % electron density will not have time to decrease significantly for
  688. % subpicosecond pulse separations. In our simulations, we use
  689. % $\delta{t} = 200\:f\!s$ pulse separation. The intensity
  690. % distributions near the silicon NP of $R = 95$~nm,
  691. % corresponding to maxima value of $K$ optimization factor, without
  692. % plasma and with generated plasma are shown in Fig. \ref{fig4}. The
  693. % intensity distribution is strongly asymmetric in the case of EHP
  694. % presence. One can note, that the excited NP is out of
  695. % quasi-resonant condition and the intensity enhancements in
  696. % Fig. \ref{fig4}(c) are weaker than in Fig. \ref{fig4}(b). Therefore,
  697. % the generated nanoplasma acts like a quasi-metallic nonconcentric
  698. % nanoshell inside the NP, providing a symmetry reduction
  699. % \cite{Wang2006}.
  700. % \begin{figure}[ht] \centering
  701. % \includegraphics[width=90mm]{fig4.png}
  702. % \caption{\label{fig4} a) Electron plasma distribution inside Si
  703. % NP $R \approx 95$~nm 50~\textit{fs} after the pulse peak;
  704. % (Kostya: Is it scattering field intensity snapshot $XXX\:f\!s$ after
  705. % the second pulse maxima passed the particle?) Intensity
  706. % distributions around and inside the NP b) without plasma,
  707. % c) with electron plasma inside.}
  708. % \end{figure}
  709. %\begin{figure} %\centering
  710. % \includegraphics[height=0.7\linewidth]{Si-flow-R140-XYZ-Eabs}
  711. % \caption{EHP distributions for nonres., MD, ED, and MQ NPs
  712. % at moderate photoexcitation. The aim is to show different possible
  713. % EHP patterns and how strong could be symmetry breaking.
  714. % \label{fgr:example}
  715. %\end{figure}
  716. %\subsection{Asymmetry analysis: effects of pulse duration, intensity
  717. % and size} It is important to optimize asymmetry by varying pulse
  718. % duration, intensity and size.
  719. \section{Conclusions} We have considered ultra-short and sufficiently
  720. intense light interactions with a single semiconductor nanoparticle
  721. under different irradiation conditions and for various particle
  722. sizes. As a result of the presented self-consistent calculations, we
  723. have obtained spatio-temporal EHP evolution inside the
  724. NPs and investigated the asymmetry of EHP distributions. % for different laser intensities. % and temporal pulse widths.
  725. %It has been demonstrated that the EHP generation strongly affects
  726. %NP scattering and, in particular, changes the preferable
  727. %scattering direction.
  728. Different pathways of EHP evolution from the front side to the back
  729. side have been revealed, depending on the NP sizes, and the
  730. origins of different behavior have been explained by the
  731. non-stationarity of the energy deposition and different quality
  732. resonant factors for exciting the electric and magnetic dipole
  733. resonances, intensity distribution by Mie theory and newly
  734. plasma-induced nonlinear effects. The effect of the strong broadband
  735. electric dipole resonance on the EHP asymmetric distribution during
  736. first optical cycles has been revealed for different size
  737. parameters. The higher EHP asymmetry is established for NPs
  738. of smaller sizes below the first magnetic dipole
  739. resonance. Essentially different EHP evolution and lower asymmetry is
  740. achieved for larger NPs due to the stationary intensity
  741. enhancement in the back side of the NP. The EHP densities
  742. above the critical value were shown to lead to the EHP distribution
  743. homogenization.
  744. % In particular, the scattering efficiency factor is used to define
  745. % the optimum NP size for preferential forward or backward
  746. % scattering. Furthermore, a parameter has been introduced to describe
  747. % the scattering asymmetry as a ratio of the EHP density in the front
  748. % side to that in the back side of the NP. This parameter
  749. % can be then used for two-dimensional scattering mapping, which is
  750. % particularly important in numerous photonics applications.
  751. The EHP asymmetry opens a wide range of applications in NP
  752. nanomashining/manipulation at nanoscale, in catalysis as well as numerous
  753. nano-bio-applications. The observed plasma-induced breaking symmetry
  754. can be also useful for beam steering, or for the enhanced second
  755. harmonics generation.
  756. \section{Acknowledgments}
  757. A. R. and T. E. I. gratefully acknowledge the CINES of CNRS for
  758. computer support. S. V. M. is thankful to ITMO Fellowship
  759. Program. This work was partially supported by Russian Foundation for
  760. Basic Researches (grants 17-03-00621, 17-02-00538, 16-29-05317).
  761. %%%END OF MAIN TEXT%%%
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