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  105. %%%TITLE, AUTHORS AND ABSTRACT%%%
  106. \twocolumn[
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  111. \includegraphics{head_foot/DOI} & \noindent\LARGE{\textbf{Photogenerated Electron-Hole Plasma Induced Symmetry Breaking in Spherical Silicon Nanoparticle}} \\%Article title goes here instead of the text "This is the title"
  112. \vspace{0.3cm} & \vspace{0.3cm} \\
  113. & \noindent\large{Anton Rudenko,$^{\ast}$\textit{$^{a}$} Konstantin Ladutenko,\textit{$^{b}$} Sergey Makarov\textit{$^{b}$} and Tatiana E. Itina\textit{$^{a}$$^{b}$}
  114. \textit{$^{a}$~Laboratoire Hubert Curien, UMR CNRS 5516, University of Lyon/UJM, 42000, Saint-Etienne, France }
  115. \textit{$^{b}$~ITMO University, Kronverksiy pr. 49, Saint-Petersburg, Russia}
  116. } \\%Author names go here instead of "Full name", etc.
  117. \includegraphics{head_foot/dates}
  118. & \noindent\normalsize
  119. {The concept of nonlinear all-dielectric nanophotonics based on high
  120. refractive index (e.g., silicon) nanoparticles supporting magnetic
  121. optical response has recently emerged as a powerful tool for ultrafast
  122. all-optical modulation at nanoscale. A strong modulation can be
  123. achieved via photo-generation of dense electron-hole plasma in the
  124. regime of simultaneous excitation of electric and magnetic Mie
  125. resonances, resulting in an effective transient reconfiguration of
  126. nanoparticle scattering properties. However, only homogeneous plasma
  127. generation was previously considered in a photo-excited
  128. nanoparticle, remaining unexplored any effects related to the
  129. plasma-induced optical inhomogeneities. Here we examine these
  130. effects by using 3D numerical modeling of coupled electrodynamic and
  131. material ionization equations. Based on the simulation results, we
  132. observed a deeply subwavelength plasma-induced nanopatterning of
  133. spherical silicon nanoparticles. In particular, we revealed strong
  134. symmetry breaking in the initially symmetrical nanoparticle, which
  135. arises during ultrafast photoexcitation near the magnetic dipole
  136. resonance. The proposed ultrafast breaking of the nanoparticle
  137. symmetry paves the way to the novel opportunities for nonlinear
  138. optical nanodevices.}
  139. \end{tabular}
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  141. ]%%%END OF TITLE, AUTHORS AND ABSTRACT%%%
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  144. \section*{} \vspace{-1cm}
  145. %%%FOOTNOTES%%%
  146. \footnotetext{\textit{$^{a}$~Univ Lyon, UJM-St-Etienne, CNRS UMR 5516,
  147. F-42000, Saint-Etienne, France}} \footnotetext{\textit{$^{b}$~ITMO
  148. University, Kronverksiy pr. 49, St. Petersburg, Russia}}
  149. % Please use \dag to cite the ESI in the main text of the article.
  150. % If you article does not have ESI please remove the the \dag symbol
  151. % from the title and the footnotetext below.
  152. % \footnotetext{\dag~Electronic Supplementary Information (ESI)
  153. % available: [details of any supplementary information available
  154. % should be included here]. See DOI:10.1039/b000000x/} %additional
  155. % addresses can be cited as above using the lower-case letters, c, d,
  156. % e... If all authors are from the same address, no letter is required
  157. % \footnotetext{\ddag~Additional footnotes to the title and authors can
  158. % be included \emph{e.g.}\ `Present address:' or `These authors
  159. % contributed equally to this work' as above using the symbols: \ddag,
  160. % \textsection, and \P. Please place the appropriate symbol next to the
  161. % author's name and include a \texttt{\textbackslash footnotetext} entry
  162. % in the the correct place in the list.}
  163. %%%END OF FOOTNOTES%%%
  164. %%%MAIN TEXT%%%%
  165. \section{Introduction}
  166. All-dielectric nonlinear nanophotonics based on high refractive index
  167. dielectric materials has become prospective paradigm in modern optics, owing to
  168. recent advances in harmonics generation~\cite{shcherbakov2014enhanced,
  169. yang2015nonlinear, makarov2016self, shorokhov2016multifold,
  170. makarov2017efficient, makarov2017light} and ultrafast all-optical
  171. modulation~\cite{iyer2015reconfigurable, makarov2015tuning,
  172. shcherbakov2015ultrafast, yang2015nonlinear, baranov2016nonlinear,
  173. baranov2016tuning, shcherbakov2017ultrafast}. In fact,
  174. all-dielectric nanoantennas and metasurfaces possess much smaller
  175. parasitic Joule losses at high intensities as compared with their
  176. plasmonic counterparts, whereas their nonlinear properties are
  177. comparable. More importantly, the unique properties of nonlinear
  178. all-dielectric nanodevices are due to the existence of both electric and
  179. magnetic optical resonances in visible and near IR
  180. ranges~\cite{kuznetsov2016optically}. For instance, even slight
  181. variation of dielectric permittivity around optical resonances leads
  182. to significant changes in optical properties (transmittance or
  183. reflectance) of all-dielectric nanoantennas~\cite{makarov2015tuning,
  184. baranov2016nonlinear, baranov2016tuning} and
  185. metasurfaces~\cite{iyer2015reconfigurable, shcherbakov2015ultrafast,
  186. yang2015nonlinear, shcherbakov2017ultrafast}.
  187. \begin{figure}[t] \centering
  188. \includegraphics[width=0.75\linewidth]{Concept.pdf}
  189. \caption{Schematic illustration of electron-hole plasma 2D and 1D
  190. distributions in silicon nanoparticle around a magnetic resonance.}
  191. \label{fgr:concept}
  192. \end{figure}
  193. In previous works on all-dielectric nonlinear nanostructures, the
  194. building blocks (nanoparticles) were considered as objects with
  195. dielectric permittivity \textit{homogeneously} distributed over
  196. nanoparticle (NP). Therefore, in order to manipulate the propagation
  197. angle of the transmitted light it was proposed to use complicated
  198. nanostructures with reduced symmetry~\cite{albella2015switchable,
  199. baranov2016tuning, shibanuma2016unidirectional}. On the other hand,
  200. plasma explosion imaging technique~\cite{Hickstein2014} revealed
  201. \textit{in situ} strongly asymmetrical electron-hole plasma (EHP)
  202. distribution in various dielectric NPs during their pumping by
  203. femtosecond laser pulses. Therefore, local permittivity in the
  204. strongly photoexcited NPs can be significantly inhomogeneous, and
  205. symmetry of nanoparticles can be reduced.
  206. %The forward ejection of ions was attributed in this case to a nanolensing effect inside the NP and to intensity enhancement as low as $10\%$ on the far side of the NP. Much stronger enhancements can be achieved near electric and magnetic dipole resonances excited in single semiconductor NPs, such as silicon (Si), germanium (Ge) etc.
  207. In this Letter, we show theoretically that ultra-fast photo-excitation
  208. in a spherical silicon NP leads to a strongly inhomogeneous EHP
  209. distribution, as is shown schematically in Fig.~\ref{fgr:concept}. To
  210. reveal and analyze this effect, we perform a full-wave numerical
  211. simulation. We consider an intense femtosecond (\textit{fs}) laser
  212. pulse to interact with a silicon NP supporting Mie resonances and
  213. two-photon EHP generation. In particular, we couple finite-difference
  214. time-domain (FDTD) method used to solve three-dimensional Maxwell
  215. equations with kinetic equations describing nonlinear EHP generation.
  216. Three-dimensional transient variation of the material dielectric
  217. permittivity is calculated for NPs of several sizes. The obtained
  218. results propose a novel strategy to create complicated non-symmetrical
  219. nanostructures by using single photo-excited spherical silicon
  220. NPs. Moreover, we show that a dense EHP can be generated at deeply
  221. subwavelength scale ($< \lambda / 10$) supporting the formation of
  222. small metalized parts inside the NP. In fact, such effects transform a
  223. dielectric NP to a hybrid metall-dielectric one strongly extending
  224. functionality of the ultrafast optical nanoantennas.
  225. %Plan:
  226. %\begin{itemize}
  227. %\item Fig.3: Temporal evolution of EHP in NP with fixed diameter (at
  228. %MD) at different intensities, in order to show possible regimes of
  229. %plasma-patterning of NP volume. It would be nice, if we will show
  230. %power patterns decencies on intensity for side probe pulse to show beam steering due to symmetry breaking.
  231. %\item Fig.4: (a) Dependence on pulse duration is also interesting. We
  232. %have to show at which duration the asymmetry factor is saturated. (b)
  233. %2D map of asymmetry factor in false colors, where x-axis and y-axis correspond to intensity and NP diameter.
  234. %\end{itemize} %Additionally, if you will manage to calculate
  235. %evolution of scattering power pattern and show considerable effect of
  236. % beam steering, we can try Nanoscale or LPR, because the novelty will
  237. % be very high.
  238. \section{Modeling details}
  239. We focus attention on silicon because this material is promising for
  240. the implementation of numerous nonlinear photonic devices. This
  241. advantage is based on a broad range of optical nonlinearities, strong
  242. two-photon absorption, as well as a possibility of the photo-induced
  243. EHP excitation~\cite{leuthold2010nonlinear}. Furthermore, silicon
  244. nanoantennas demonstrate a sufficiently high damage threshold due to
  245. the high melting temperature ($\approx 1690$~K), whereas its nonlinear
  246. optical properties were extensively studied during the last
  247. decades~\cite{Van1987, Sokolowski2000, leuthold2010nonlinear}. High
  248. silicon melting point typically preserves structures formed from this
  249. material up to the EHP densities on the order of the critical value~\cite{Korfiatis2007}
  250. $N_{cr} \approx 5\cdot{10}^{21}$~cm$^{-3}$. At
  251. the critical density and above, silicon acquires metallic properties
  252. ($Re(\epsilon) < 0$) and contributes to the EHP reconfiguration during
  253. ultrashort laser irradiation.
  254. The process of three-dimensional photo-generation and temporal
  255. evolution of EHP in silicon NPs has not been modeled
  256. before. Therefore, herein we propose a model considering ultrashort
  257. laser interactions with a resonant silicon sphere, where the EHP is
  258. generated via one- and two-photon absorption processes. Importantly,
  259. we also consider nonlinear feedback of the material by taking into
  260. account the intraband light absorption on the generated free
  261. carriers. To simplify our model, we neglect free carrier diffusion due
  262. to the considered short time scales. In fact, the aim of the present
  263. work is to study the EHP dynamics \textit{during} ultra-short
  264. (\textit{fs}) laser interaction with the NP. The created electron-hole
  265. modifies both laser-particle interaction and, hence, the following
  266. particle evolution. However, the plasma then will recombine at
  267. picosecond time scale.
  268. \subsection{Light propagation}
  269. The incident wave propagates in positive direction of $z$ axis, the NP
  270. geometric center located at $z=0$ front side corresponds to the volume
  271. $z>0$ and back side for $z<0$, as shown in
  272. Fig.~\ref{fgr:concept}. Ultra-short laser interaction and light
  273. propagation inside the silicon NP are modeled by solving the system of
  274. three-dimensional Maxwell's equations written in the following way
  275. \begin{align} \begin{cases} \label{Maxwell}$$
  276. \displaystyle{\frac{\partial{\vec{E}}}{\partial{t}}=\frac{\nabla\times\vec{H}}{\epsilon_0\epsilon}-\frac{1}{\epsilon_0\epsilon}(\vec{J}_p+\vec{J}_{Kerr})} \\
  277. \displaystyle{\frac{\partial{\vec{H}}}{\partial{t}}=-\frac{\nabla\times\vec{E}}{\mu_0}},
  278. $$ \end{cases}
  279. \end{align}
  280. where $\vec{E}$ is the electric field, $\vec{H}$ is the magnetizing
  281. field, $\epsilon_0$ is the free space permittivity, $\mu_0$ is the
  282. permeability of free space, $\epsilon = n^2 = 3.681^2$ is the
  283. permittivity of non-excited silicon at $800$~nm wavelength
  284. \cite{Green1995}, $\vec{J}_p$ and $\vec{J}_{Kerr}$ are the nonlinear
  285. currents, which include the contribution due to Kerr effect
  286. $\vec{J}_{Kerr} =
  287. \epsilon_0\epsilon_\infty\chi_3\frac{\partial\left(\left|\vec{E}\right|^2\vec{E}\right)}{\partial{t}}$,
  288. where $\chi_3 =4\cdot{10}^{-20}$ m$^2$/V$^2$ for laser wavelength
  289. $\lambda = 800$~nm \cite{Bristow2007}, and heating of the conduction
  290. band, described by the differential equation derived from the Drude
  291. model
  292. \begin{equation} \label{Drude}
  293. \displaystyle{\frac{\partial{\vec{J_p}}}{\partial{t}} = -
  294. \nu_e\vec{J_p} + \frac{e^2N_e(t)}{m_e^*}\vec{E}},
  295. \end{equation}
  296. where $e$ is the elementary charge, $m_e^* = 0.18m_e$ is the reduced
  297. electron-hole mass \cite{Sokolowski2000}, $N_e(t)$ is the
  298. time-dependent free carrier density and $\nu_e = 10^{15}$~s$^{-1}$ is
  299. the electron collision frequency \cite{Sokolowski2000}. Silicon
  300. NP is surrounded by vacuum, where the light propagation is
  301. calculated by Maxwell's equations with $\vec{J} = 0$ and
  302. $\epsilon = 1$. The system of Maxwell's equations coupled with
  303. electron density equation is solved by the finite-difference numerical
  304. method \cite{Rudenko2016}, based on the finite-difference time-domain
  305. (FDTD) \cite{Yee1966} and auxiliary-differential methods for
  306. dispersive media \cite{Taflove1995}. At the edges of the grid, we
  307. apply the absorbing boundary conditions related to convolutional
  308. perfectly matched layers to avoid nonphysical reflections
  309. \cite{Roden2000}. The initial electric field is introduced as a
  310. Gaussian slightly focused beam as follows
  311. \begin{align}
  312. \begin{aligned}
  313. \label{Gaussian}
  314. {E_x}(t, r, z) = \frac{w_0}{w(z)}{exp}\left(i\omega{t} - \frac{r^2}{{w(z)}^2} - ikz - ik\frac{r^2}{2R(z)} + i\varsigma(z)\right)\\
  315. \times\;{exp}\left(-\frac{4\ln{2}(t-t_0)^2}{\theta^2}\right),
  316. \end{aligned}
  317. \end{align}
  318. where $\theta \approx 130$~\textit{fs} is the temporal pulse width at
  319. the half maximum (FWHM), $t_0$ is the time delay, $w_0 = 3{\mu}m$ is the
  320. beam waist, $w(z) = {w_0}\sqrt{1+(\frac{z}{z_R})^2}$ is the Gaussian's
  321. beam spot size, $\omega = 2{\pi}c/{\lambda}$ is the angular frequency,
  322. $\lambda = 800$~nm is the laser wavelength in air, $c$ is the speed of
  323. light, ${z_R} = \frac{\pi{{w_0}^2}n_0}{\lambda}$ is the Rayleigh
  324. length, $r = \sqrt{x^2 + y^2}$ is the radial distance from the beam's
  325. waist, $R_z = z\left(1+(\frac{z_R}{z})^2\right)$ is the radius of
  326. curvature of the wavelength comprising the beam, and
  327. $\varsigma(z) = {\arctan}(\frac{z}{z_R}) $ is the Gouy phase shift.
  328. \subsection{Material ionization}
  329. To account for the material ionization induced by a
  330. sufficiently intense laser field inside the particle, we couple
  331. Maxwell's equations with the kinetic equation for the electron-hole
  332. plasma as described below.
  333. The time-dependent conduction-band carrier density evolution is
  334. described by the rate equation proposed by van Driel
  335. \cite{Van1987}. This equation takes into account such processes as
  336. photoionization, avalanche ionization and Auger recombination, and is
  337. written as
  338. \begin{equation} \label{Dens}
  339. \displaystyle{\frac{\partial{N_e}}{\partial t} =
  340. \frac{N_a-N_e}{N_a}\left(\frac{\sigma_1I}{\hbar\omega} +
  341. \frac{\sigma_2I^2}{2\hbar\omega}\right) + \alpha{I}N _e -
  342. \frac{C\cdot{N_e}^3}{C\tau_{rec}N_e^2+1},} \end{equation} where
  343. $I=\frac{n}{2}\sqrt{\frac{\epsilon_0}{\mu_0}}\left|\vec{E}\right|^2$
  344. is the intensity, $\sigma_1 = 1.021\cdot{10}^3$~cm$^{-1}$ and
  345. $\sigma_2 = 0.1\cdot{10}^{-7}$~cm/W are the one-photon and two-photon
  346. interband cross-sections \cite{Choi2002, Bristow2007, Derrien2013},
  347. $N_a = 5\cdot{10}^{22}$~cm$^{-3}$ is the particle saturation density
  348. \cite{Derrien2013}, $C = 3.8\cdot{10}^{-31}$~cm$^6$/s is the Auger
  349. recombination rate \cite{Van1987}, $\tau_{rec} = 6\cdot{10}^{-12}$~s
  350. is the minimum Auger recombination time \cite{Yoffa1980}, and
  351. $\alpha = 21.2$~cm$^2$/J is the avalanche ionization coefficient
  352. \cite{Pronko1998} at the wavelength $800$~nm in air. As we have noted,
  353. free carrier diffusion is neglected during and shortly after the laser
  354. excitation \cite{Van1987, Sokolowski2000}. In particular, from the
  355. Einstein formula
  356. $D = k_B T_e \tau/m^* \approx (1$--$\,2)\cdot{10}^{-3}$ m$^2$/s ($k_B$
  357. is the Boltzmann constant, $T_e$ is the electron temperature,
  358. $\tau=1$~\textit{fs} is the collision time, $m^* = 0.18 m_e$ is the
  359. effective mass), where $T_e \approx 2*{10}^4$ K for $N_e$ close to
  360. $N_{cr}$ \cite{Ramer2014}. It means that during the pulse duration
  361. ($\approx 130$~\textit{fs}) the diffusion length will be around
  362. 10$\,$--15~nm for $N_e$ close to $N_{cr}$.
  363. \begin{figure}[ht!]
  364. \centering
  365. \includegraphics[width=0.495\textwidth]{mie-fdtd-3}
  366. \caption{\label{mie-fdtd} (a) First four Lorentz-Mie coefficients
  367. ($a_1$, $a_2$, $b_1$, $b_2$) and (b) factors of asymmetry $G_I$,
  368. $G_{I^2}$ according to the Mie theory at fixed wavelength
  369. $800$~nm. (c, d) Squared intensity distributions at different radii
  370. \textit{R} calculated by the Mie theory and (e, f) EHP distribution
  371. for low densities $N_e \approx 10^{20}$~cm$^{-3}$ by Maxwell's
  372. equations (\ref{Maxwell}, \ref{Drude}) coupled with EHP density
  373. equation (\ref{Dens}). (c-f) Incident
  374. light propagates from the left to the right along $Z$ axis, electric
  375. field polarization $\vec{E}$ is along $X$ axis.}
  376. \end{figure}
  377. The changes of the real and imaginary parts of the permittivity
  378. associated with the time-dependent free carrier response
  379. \cite{Sokolowski2000} can be derived from equations (\ref{Maxwell},
  380. \ref{Drude}) and are written as follows
  381. \begin{align} \begin{cases} \label{Index} $$
  382. \displaystyle{Re(\epsilon^\ast) = \epsilon -\frac{{e^2}N_e}{\epsilon_0m_e^*(\omega^2+{\nu_e}^2)}} \\
  383. \displaystyle{Im(\epsilon^\ast) = \frac{{e^2}N_e\nu_e}{\epsilon_0m_e^*\omega(\omega^2+{\nu_e}^2)}.}
  384. $$ \end{cases} \end{align}
  385. \subsection{Mie calculations}
  386. A steady-state interaction of a plain electromagnetic wave with a
  387. spherical particle has a well-known analytical solution described by a
  388. Mie theory~\cite{Bohren1983}. It is only valid in the absence of
  389. nonlinear optical response, thus we can compare it against
  390. above-mentioned FDTD-EHP model only for small plasma densities, where
  391. we can neglect EHP impact to the refractive index. Non-stationary
  392. nature of a~\textit{fs} pulse increases the complexity of the
  393. analysis. A detailed discussion on the relation between the Mie theory
  394. and FDTD-EHP model will be provided in the next section.
  395. We used the Scattnlay program to evaluate calculations of Lorentz-Mie
  396. coefficients ($a_i$, $b_i$) and near-field
  397. distribution~\cite{Ladutenko2017}. This program is available online at
  398. GitHub~\cite{Scattnlay-web} under open source license.
  399. \section{Results and discussion}
  400. \subsection{Asymmetry factors}
  401. \begin{figure*}[p]
  402. \centering
  403. \includegraphics[width=140mm]{time-evolution-I-no-NP.pdf}
  404. \caption{\label{time-evolution} Temporal EHP (a, c, e) and asymmetry
  405. factor $G_{N_e}$ (b, d, f) evolution for different Si nanoparticle
  406. radii of (a, b) $R = 75$~nm, (c, d) $R = 100$~nm, and (e, f)
  407. $R = 115$~nm. Pulse duration $130$~\textit{fs} (FWHM). Wavelength
  408. $800$~nm in air. (b, d, f) Different stages of EHP evolution shown
  409. in Fig.~\ref{plasma-grid} are indicated. The temporal evolution of
  410. Gaussian beam intensity is also shown. Peak laser intensity is
  411. fixed to be 10$^{12}$~W/cm$^2$. For better visual representation of
  412. time scale at a single optical cycle we put a squared electric
  413. field profile in all plots in Fig.~\ref{time-evolution} in gray
  414. color as a background image (note linear time scale on the left
  415. column and logarithmic scale on the right one).}
  416. \end{figure*}
  417. \begin{figure*}
  418. \centering
  419. \includegraphics[width=145mm]{plasma-grid.pdf}
  420. \caption{\label{plasma-grid} EHP density snapshots inside Si
  421. nanoparticle of radii $R = 75$~nm (a-d), $R = 100$~nm (e-h) and
  422. $R = 115$~nm (i-l) taken at different times and conditions of
  423. excitation (stages $1-4$: (1) first optical cycle, (2) maximum
  424. during few optical cycles, (3) quasi-stationary regime, (4)
  425. strongly nonlinear regime). $\Delta{Re(\epsilon)}$ indicates the
  426. real part change of the local permittivity defined by Equation
  427. (\ref{Index}). Pulse duration 130~\textit{fs} (FWHM). Wavelength 800~nm in
  428. air. Peak laser intensity is fixed to be 10$^{12}$~W/cm$^2$. }
  429. \end{figure*}
  430. %\subsection{Effect of the irradiation intensity on EHP generation}
  431. We start with a pure electromagnetic problem without EHP
  432. generation. We plot in Fig.~\ref{mie-fdtd}(a) Mie coefficients of a
  433. Si NP as a function of its size for a fixed laser wavelength
  434. $\lambda = 800$~nm. For the NP sizes under consideration most of
  435. contribution to the electromagnetic response originates from electric
  436. and magnetic dipole (ED and MD), while for sizes near
  437. $R \approx 150$~nm a magnetic quadrupole (MQ) response turns to be
  438. the main one. The superposition of multipoles defines the
  439. distribution of electric field inside the NP. We introduce $G_I$
  440. factor of asymmetry, corresponding to difference between the volume
  441. integral of squared electric field in the front side ($I^{front}$) of
  442. the NP to that in the back side ($I^{back}$) normalized to their sum:
  443. $G_I = (I^{front}-I^{back})/(I^{front}+I^{back})$, where
  444. $I^{front}=\int_{(z>0)}|E|^2d{\mathrm{v}}$ and
  445. $I^{back}=\int_{(z<0)} |E|^2d{\mathrm{v}}$ are expressed via
  446. amplitude of the electric field $|E|$. The factor $G_{I^2}$ was
  447. determined in a similar way by using volume integrals of squared
  448. intensity to predict EHP asymmetry due to two-photon absorption.
  449. Fig.~\ref{mie-fdtd}(b) shows $G$ factors as a function of the NP
  450. size. For the NPs of sizes below the first MD resonance, the
  451. intensity is enhanced in the front side as in Fig.~\ref{mie-fdtd}(c)
  452. and $G_I > 0$. The behavior changes near the size resonance value,
  453. corresponding to $R \approx 105$~nm. In contrast, for larger sizes,
  454. the intensity is enhanced in the back side of the NP as demonstrated
  455. in Fig.~\ref{mie-fdtd}(d). In fact, rather similar EHP distributions
  456. can be obtained by applying Maxwell's equations coupled with the rate
  457. equation for a relatively weak excitation with EHP concentration of
  458. $N_e \approx 10^{20}$~cm$^{-3}$, see Fig.~\ref{mie-fdtd}(e,f). The
  459. optical properties do not change considerably due to the excitation
  460. according to (\ref{Index}). Therefore, the excitation processes
  461. follow the intensity distribution. However, such coincidence was
  462. achieved under quasi-stationary conditions, after the electric field
  463. made enough oscillations inside the Si NP. Further on, we present
  464. transient analysis, which reveals much more details.
  465. To achieve a quantitative description for evolution of the EHP
  466. distribution during the \textit{fs} pulse, we introduced another
  467. asymmetry factor
  468. $G_{N_e} = (N_e^{front}-N_e^{back})/(N_e^{front}+N_e^{back})$
  469. indicating the relationship between the average EHP densities in the
  470. front and in the back halves of the NP, defined as
  471. $N_e^{front}=\frac{2}{V}\int_{(z>0)} {N_e}d{\mathrm{v}}$ and
  472. $N_e^{back}=\frac{2}{V}\int_{(z<0)} {N_e}d{\mathrm{v}}$, where
  473. $V = \frac{4}{3}\pi{R}^3$ is the volume of the nanosphere. In this
  474. way, $G_{N_e} = 0$ corresponds to the symmetrical case and the
  475. assumption of the NP homogeneous EHP distribution can be made to
  476. investigate the optical response of the excited Si NP. When $G_{N_e}$
  477. significantly differs from $0$, this assumption, however, could not
  478. be justified. In what follows, we discuss the results of the
  479. numerical modeling of the temporal evolution of EHP densities and the
  480. asymmetry factors $G_{N_e}$ for different sizes of Si NP, as shown in
  481. Fig.~\ref{time-evolution}). Typical change in permittivity
  482. corresponding to each stage is shown in Fig.~\ref{plasma-grid}. It
  483. reveals the EHP evolution stages during interaction of femtosecond
  484. laser pulse with the Si NPs.
  485. \subsection{Stages of transient Si nanoparticle photoexcitation}
  486. To describe all the stages of non-linear light interaction with Si
  487. NP, we present the calculation results obtained by using Maxwell's
  488. equations coupled with electron kinetics equations for different
  489. radii for resonant and non-resonant conditions at peak intensity
  490. 10$^{12}$~W/cm$^2$ and $\lambda = 800~nm$. In this case, the geometry
  491. of the EHP distribution can strongly deviate from the intensity
  492. distribution given by the Mie theory. Two main reasons cause the
  493. deviation: (i) non-stationarity of interaction between
  494. electromagnetic pulse and NP (ii) nonlinear effects, taking place due
  495. to transient optical changes in Si. The non-stationary intensity
  496. deposition during \textit{fs} pulse results in different time delays
  497. for exciting electric and magnetic resonances inside Si NP because of
  498. different quality factors $Q$ of the resonances. In particular, MD
  499. resonance (\textit{b1}) has $Q \approx 8$, whereas electric one
  500. (\textit{a1}) has $Q \approx 4$. The larger particle supporting MQ
  501. resonance (\textit{b2}) demonstrates $ Q \approx 40$. As soon as the
  502. electromagnetic wave period at $\lambda = 800$~nm is
  503. $\approx 2.7$~\textit{fs}, one needs about 10~\textit{fs} to pump the
  504. ED, 20~\textit{fs} for the MD, and about 100~\textit{fs} for the MQ.
  505. According to these considerations, after few optical cycles taking
  506. place on a 10~\textit{fs} scale it results in the excitation of the
  507. low-\textit{Q} ED resonance, which dominates MD and MQ independently
  508. on the exact size of NPs. Moreover, during the first optical cycle
  509. there is no multipole modes structure inside NP, which results in a
  510. very similar field distribution for all sizes of NP under
  511. consideration as shown in Fig.~\ref{plasma-grid}(a,e,i). We address
  512. to this phenomena as \textit{'Stage~1'}. This stage demonstrates the
  513. initial penetration of electromagnetic field into the NP during the
  514. first optical cycle. Resulting factors $G_{N_e}$ exhibit sharp
  515. increase at this stage (Fig.~\ref{time-evolution}(b,d,f), yielding
  516. strong and ultrafast symmetry breaking.
  517. \textit{'Stage~2'} corresponds to further electric field oscillations
  518. ($t \approx 5$--$15$~\textit{fs}) leading to the formation of ED E-field
  519. pattern in the center of the Si NP as shown in
  520. Fig.~\ref{plasma-grid}(f,j). We stress the nonstationary nature of
  521. E-field pattern at this stage, whereas there is a simultaneous growth
  522. of the incident pulse amplitude. This leads to a superposition of ED
  523. near-field pattern with that from Stage 1, resulting in EHP
  524. concentration in the front side of the Si NP. This effect dominates
  525. for the smallest NP with $R=75$~nm in Fig.~\ref{plasma-grid}(b),
  526. where ED mode is tuned far away from the resonance (see
  527. Fig.~\ref{mie-fdtd}(c) for field suppression inside NP predicted by
  528. the Mie theory). At this stage, the density of EHP
  529. ($N_e < 10^{20}$~cm$^2$) is still not high enough to significantly
  530. affect the optical properties of the NP
  531. (Figs.~\ref{time-evolution}(a,c,e)).
  532. When the number of optical cycles is large enough
  533. ($t>20$~\textit{fs}) both ED and MD modes can be exited to the level
  534. necessary to achieve the stationary intensity pattern corresponding
  535. to the Mie-based intensity distribution at \textit{'Stage~3'}
  536. (see Fig.~\ref{plasma-grid}(c,g,k)). The EHP density for the most
  537. volume of NP is still relatively small to affect the EHP evolution,
  538. but is already high enough to change the local optical properties,
  539. i.e. real part of permittivity. Below the MD resonance ($R = 75$~nm),
  540. the EHP is mostly localized in the front side of the NP as shown in
  541. Fig.~\ref{plasma-grid}(c). The highest quasi-stationary asymmetry
  542. factor $G_{N_e} \approx 0.5$--$0.6$ is achieved in this case
  543. (Fig~\ref{time-evolution}(b)). At the MD resonance conditions
  544. ($R = 100$~nm), the EHP distribution has a toroidal shape and is much
  545. closer to the homogeneous distribution. In contrast, above the MD
  546. resonant size for $R = 115$~nm the $G_{N_e} < 0$ due to the fact that
  547. EHP is dominantly localized in the back side of the NP.
  548. Diue to a quasi-stationary pumping during Stage~3,
  549. it is superposed with Stage~1 field pattern, resulting in an
  550. additional EHP localized in the front side. This can be seen when
  551. comparing result from the Mie theory in Fig.~\ref{mie-fdtd}(d) with
  552. that of full 3D simulation in Fig.~\ref{mie-fdtd}(f). Note that
  553. pumping of NP significantly changes during a single optical cycle,
  554. this leads to a large variation of asymmetry factor $G_{N_e}$ at the
  555. first stage. This variation steadily decreases as it goes to Stage~3,
  556. as shown in Fig.~\ref{time-evolution}(b,d,f).
  557. To explain this effect, we consider the time evolution of average EHP
  558. densities $N_e$ in the front and back halves of the NP presented in
  559. Fig.~\ref{time-evolution}(a,c,e). As soon as the recombination and
  560. diffusion processes are negligible at \textit{fs} time scale, both
  561. $N_e^{front}$ and $N_e^{back}$ curves experience monotonous behavior
  562. with small pumping steps synced to the incident pulse. The front and
  563. the back halves of NP are separated in space, which obviously leads
  564. to the presence of time delay between pumping steps in each curve
  565. caused by the same optical cycle of the incident wave. This delay
  566. causes a large asymmetry factor during the first stage. However, as soon
  567. as average EHP density increases, the relative contribution of these
  568. pumping steps to the resulting asymmetry becomes smaller. This way
  569. variations of asymmetry $G_{N_e}$ synced with the period of incident
  570. light decrease.
  571. Higher excitation conditions are followed by larger values of
  572. electric field amplitude, which leads to the appearance of high EHP
  573. densities causing a significant change in the optical properties of
  574. silicon according to the equations (\ref{Index}). From the Mie
  575. theory, the initial (at the end of Stage~3) spatial pattern of the
  576. optical properties is non-homogeneous. When non-homogeneity of the
  577. optical properties becomes strong enough it leads to the
  578. reconfiguration of the E-field inside NP, which in turn strongly
  579. affects further reconfiguration of the optical properties. We refer
  580. to these strong nonlinear phenomena as \textit{'Stage~4'}. In
  581. general, the reconfiguration of the electric field is unavoidable as
  582. far as the result from the Mie theory comes with the assumption of
  583. homogeneous optical properties in a spherical NP.
  584. Thus, the evolution of EHP density during Stage~4 depends on the
  585. result of multipole modes superposition at the end of Stage~3 and is
  586. quite different as we change the size of NP. For $R=75$~nm and
  587. $R=100$~nm, we observe a front side asymmetry before Stage~4,
  588. however, its origin is quite different. The $R=75$~nm NP is out
  589. of resonance, moreover, Mie field pattern and the one, which comes
  590. from Stage~1 are quite similar. As soon as EHP density becomes
  591. high enough to change optical properties, the NP is still out of
  592. resonance, however, the presence of EHP increases absorption in
  593. agreement with (\ref{Index}), decreases Q-factor, and destroys
  594. optical modes.
  595. % This effect effectively leads to a partial screening, and it
  596. % becomes harder for the incident wave to penetrate deeper into
  597. % EHP. Finally, this finishes spilling the NP`s volume with plasma
  598. % reducing the asymmetry, see Fig.~\ref{plasma-grid}(d).
  599. For $R=100$~nm, the evolution during the final stage goes in a
  600. similar way, with a notable exception regarding MD resonance. As
  601. soon as presence of EHP increases the absorption, it suppresses the
  602. MD resonance with symmetric filed pattern, thus, the asymmetry factor
  603. can be increased. This result was observed in
  604. Fig.~\ref{time-evolution}(d) with a local maximum near 100~\textit{fs}
  605. mark.
  606. The last NP with $R=115$~nm shows the most complex behavior during
  607. Stage~4. The superposition of Mie-like E-field pattern with that
  608. from Stage~1 results in the presence of two EHP spatial maxima, back
  609. and front shifted. They serve as starting seeds for the EHP
  610. formation, and an interplay between them forms a complex behavior of
  611. the asymmetry factor curve. Namely, the sign is changed from negative
  612. to positive and back during the last stage. This numerical result can
  613. hardly be explained in a simple qualitative manner, it is too complex
  614. to account all near-field interaction of incident light with two EHP
  615. regions inside a single NP. It is interesting to note, however, that
  616. in a similar way as it was for $R=100$~nm the increased absorption
  617. should destroy ED and MD resonances, which are responsible for the
  618. back-shifted EHP. As soon as this EHP region is quite visible on the
  619. last snapshot in Fig.~\ref{plasma-grid}(l), this means that EHP seeds
  620. are self-supporting.
  621. %A bookmark by Kostya
  622. As the EHP acquires quasi-metallic properties at stronger excitation
  623. $N_e > 5\cdot{10}^{21}$~cm$^{-3}$, the EHP distribution evolves
  624. inside NPs because of the photoionization and avalanche ionization
  625. induced transient optical response and the effect of newly formed
  626. EHP. This way, the distribution becomes more homogeneous and the
  627. effect is likely to be enhanced by electron diffusion inside Si
  628. NPs.
  629. It is worth noting that it is possible to achieve the formation of
  630. deeply subwavelength EHP regions due to high field localization. The
  631. smallest EHP localization and the larger asymmetry factor are
  632. achieved below the MD resonant conditions for $R < 100$~nm.
  633. Thus, the EHP distribution in Fig.~\ref{plasma-grid}(c) is optimal for
  634. symmetry breaking in Si NP, as it results in the larger asymmetry
  635. factor $G_{N_e}$ and higher electron densities $N_e$. We stress here
  636. that such regime could be still safe for NP due to the very small
  637. volume where such high EHP density is formed.
  638. % \subsection{Effects of NP size and scattering efficiency
  639. % factor on scattering directions}
  640. % \begin{figure}[ht] \centering
  641. % \includegraphics[width=90mm]{time-evolution.png}
  642. % \caption{\label{time-evolution} a) Scattering efficiency factor $Q_{sca}$
  643. % dependence on the radius $R$ of non-excited silicon NP
  644. % calculated by Mie theory; b) Parameter of forward/backward scattering
  645. % dependence on the radius $R$ calculated by Mie theory for non-excited
  646. % silicon NP c) Optimization parameter $K$ dependence on the
  647. % average electron density $n_e^{front}$ in the front half of the
  648. % NP for indicated radii (1-7).}
  649. % \end{figure}
  650. % We have discussed the EHP kinetics for a silicon NP of a
  651. % fixed radius $R \approx 105$~nm. In what follows, we investigate the
  652. % influence of the NP size on the EHP patterns and temporal
  653. % evolution during ultrashort laser irradiation. A brief analysis of
  654. % the initial intensity distribution inside the NP given by
  655. % the classical Mie theory for homogeneous spherical particles
  656. % \cite{Mie1908} can be useful in this case. Fig. \ref{time-evolution}(a, b)
  657. % shows the scattering efficiency and the asymmetry parameter for
  658. % forward/backward scattering for non-excited silicon NPs of
  659. % different radii calculated by Mie theory \cite{Mie1908}. Scattering
  660. % efficiency dependence gives us the value of resonant sizes of
  661. % NPs, where the initial electric fields are significantly
  662. % enhanced and, therefore, we can expect that the following conditions
  663. % will result in a stronger electron density gradients. Additionally,
  664. % in the case of maximum forward or backward scattering, the initial
  665. % intensity distribution has the maximum of asymmetry. One can note,
  666. % that for $R \approx 100$~nm and $R \approx 150$~nm both criteria are
  667. % fulfilled: the intensity is enhanced $5-10$ times due to
  668. % near-resonance conditions and its distribution has a strong
  669. % asymmetry.
  670. % In what follows, we present the calculation results obtained by
  671. % using Maxwell's equations coupled with electron kinetics for
  672. % different extremum radii for resonant and non-resonant
  673. % conditions. One can note, that the maximum asymmetry factor of EHP
  674. % $G$ does not guarantee the optimal asymmetry of intensity
  675. % distribution, as the size of generated plasma and the value of the
  676. % electron density equally contribute to the change of the modified
  677. % NP optical response. For example, it is easier to localize
  678. % high electron densities inside smaller NPs, however, due
  679. % to the negligible size of the generated EHP with respect to laser
  680. % wavelength in media, the intensity distribution around the
  681. % NP will not change considerably. Therefore, we propose to
  682. % introduce the optimization factor
  683. % $K = \frac{n_e(G-1)R^2}{n_{cr}G{R_0^2}}$, where $R_0 = 100$~nm,
  684. % $n_{cr} = 5\cdot{10}^{21}~cm^{-3}$, and $G$ is asymmetry of EHP,
  685. % defined previously. The calculation results for different radii of
  686. % silicon NPs and electron densities are presented in
  687. % Fig. \ref{time-evolution}(c). One can see, that the maximum value are achieved
  688. % for the NPs, that satisfy both initial maximum forward
  689. % scattering and not far from the first resonant condition. For larger
  690. % NPs, lower values of EHP asymmetry factor are obtained, as
  691. % the electron density evolves not only from the intensity patterns in
  692. % the front side of the NP but also in the back side.
  693. %TODO:
  694. %Need to discuss agreement/differences between Mie and FDTD+rate. Anton ?!
  695. % To demonstrate the effect of symmetry breaking, we calculate the
  696. % intensity distribution around the NP for double-pulse
  697. % experiment. The first pulse of larger pulse energy and polarization
  698. % along $Ox$ generates asymmetric EHP inside silicon NP,
  699. % whereas the second pulse of lower pulse energy and polarization $Oz$
  700. % interacts with EHP after the first pulse is gone. The minimum
  701. % relaxation time of high electron density in silicon is
  702. % $\tau_{rec} = 6\cdot{10}^{-12}$~s \cite{Yoffa1980}, therefore, the
  703. % electron density will not have time to decrease significantly for
  704. % subpicosecond pulse separations. In our simulations, we use
  705. % $\delta{t} = 200\:f\!s$ pulse separation. The intensity
  706. % distributions near the silicon NP of $R = 95$~nm,
  707. % corresponding to maxima value of $K$ optimization factor, without
  708. % plasma and with generated plasma are shown in Fig. \ref{fig4}. The
  709. % intensity distribution is strongly asymmetric in the case of EHP
  710. % presence. One can note, that the excited NP is out of
  711. % quasi-resonant condition and the intensity enhancements in
  712. % Fig. \ref{fig4}(c) are weaker than in Fig. \ref{fig4}(b). Therefore,
  713. % the generated nanoplasma acts like a quasi-metallic nonconcentric
  714. % nanoshell inside the NP, providing a symmetry reduction
  715. % \cite{Wang2006}.
  716. % \begin{figure}[ht] \centering
  717. % \includegraphics[width=90mm]{fig4.png}
  718. % \caption{\label{fig4} a) Electron plasma distribution inside Si
  719. % NP $R \approx 95$~nm 50~\textit{fs} after the pulse peak;
  720. % (Kostya: Is it scattering field intensity snapshot $XXX\:f\!s$ after
  721. % the second pulse maxima passed the particle?) Intensity
  722. % distributions around and inside the NP b) without plasma,
  723. % c) with electron plasma inside.}
  724. % \end{figure}
  725. %\begin{figure} %\centering
  726. % \includegraphics[height=0.7\linewidth]{Si-flow-R140-XYZ-Eabs}
  727. % \caption{EHP distributions for nonres., MD, ED, and MQ NPs
  728. % at moderate photoexcitation. The aim is to show different possible
  729. % EHP patterns and how strong could be symmetry breaking.
  730. % \label{fgr:example}
  731. %\end{figure}
  732. %\subsection{Asymmetry analysis: effects of pulse duration, intensity
  733. % and size} It is important to optimize asymmetry by varying pulse
  734. % duration, intensity and size.
  735. \section{Conclusions} We have rigorously modeled and studied
  736. ultra-fast and intense light interaction with a single silicon
  737. nanoparticle of various sizes for the first time to our best
  738. knowledge. As a result of the presented self-consistent nonlinear
  739. calculations, we have obtained spatio-temporal EHP evolution inside
  740. the NPs and investigated the asymmetry of the EHP distributions. We
  741. have revealed EHP strong asymmetric distribution during the first optical
  742. cycle for different sizes. The highest average EHP asymmetry has
  743. been observed for NPs of smaller sizes below the first magnetic
  744. dipole resonance, when EHP is concentrated in the front side mostly
  745. during the laser pulse absorption. Essentially different EHP
  746. evolution and lower asymmetry has been achieved for larger NPs due to
  747. the intensity enhancement in the back side of the NP. The EHP
  748. densities above the critical value have been shown to lead to
  749. homogenization of the EHP distribution. The observed plasma-induced
  750. breaking symmetry can be useful for creation of nonsymmetrical
  751. nanophotonic designes, e.g. for beam steering or enhanced second
  752. harmonics generation. Also, the asymmetric EHP opens a wide range of
  753. applications in NP nanomashining at deeply subwavelength scale.
  754. \section{Acknowledgments}
  755. A. R. and T. E. I. gratefully acknowledge the CINES of CNRS for
  756. computer support. S. V. M. is thankful to ITMO Fellowship
  757. Program. This work was partially supported by Russian Foundation for
  758. Basic Researches (grants 17-03-00621, 17-02-00538, 16-29-05317).
  759. %%%END OF MAIN TEXT%%%
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  765. % from 'References' to 'Notes and references' using the following
  766. % command:
  767. % \renewcommand\refname{Notes and references}
  768. %%%REFERENCES%%%
  769. \bibliography{References} %You need to replace "rsc" on this line
  770. %with the name of your .bib file
  771. \bibliographystyle{rsc} %the RSC's .bst file
  772. \end{document}