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  105. %%%TITLE, AUTHORS AND ABSTRACT%%%
  106. \twocolumn[
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  111. \includegraphics{head_foot/DOI} & \noindent\LARGE{\textbf{Photogenerated Electron-Hole Plasma Induced Symmetry Breaking in Spherical Silicon Nanoparticle}} \\%Article title goes here instead of the text "This is the title"
  112. \vspace{0.3cm} & \vspace{0.3cm} \\
  113. & \noindent\large{Anton Rudenko,$^{\ast}$\textit{$^{a}$} Konstantin Ladutenko,\textit{$^{b}$} Sergey Makarov\textit{$^{b}$} and Tatiana E. Itina\textit{$^{a}$$^{b}$}
  114. \textit{$^{a}$~Laboratoire Hubert Curien, UMR CNRS 5516, University of Lyon/UJM, 42000, Saint-Etienne, France }
  115. \textit{$^{b}$~ITMO University, Kronverksiy pr. 49, St. Petersburg, Russia}
  116. } \\%Author names go here instead of "Full name", etc.
  117. \includegraphics{head_foot/dates}
  118. & \noindent\normalsize
  119. {The concept of nonlinear all-dielectric nanophotonics based on high
  120. refractive index (e.g., silicon) nanoparticles supporting magnetic
  121. optical response has recently emerged as a powerful tool for ultrafast
  122. all-optical modulation at nanoscale. A strong modulation can be
  123. achieved via photo-generation of dense electron-hole plasma in the
  124. regime of simultaneous excitation of electric and magnetic optical
  125. resonances, resulting in an effective transient reconfiguration of
  126. nanoparticle scattering properties. However, only homogeneous plasma
  127. generation was previously considered in the photo-excited
  128. nanoparticle, remaining unexplored any effects related to the
  129. plasma-induced optical inhomogeneities. Here we examine these
  130. effects by using 3D numerical modeling of coupled electrodynamic and
  131. material ionization equations. Based on the simulation results, we
  132. observed a deeply subwavelength plasma-induced nanopatterning of
  133. spherical silicon nanoparticles. In particular, we revealed strong
  134. symmetry breaking in the initially symmetrical nanoparticle, which
  135. arises during ultrafast photoexcitation near the magnetic dipole
  136. resonance. The proposed ultrafast breaking of the nanoparticle
  137. symmetry paves the way to the novel opportunities for nonlinear
  138. optical nanodevices.}
  139. \end{tabular}
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  141. ]%%%END OF TITLE, AUTHORS AND ABSTRACT%%%
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  144. \section*{} \vspace{-1cm}
  145. %%%FOOTNOTES%%%
  146. \footnotetext{\textit{$^{a}$~Univ Lyon, UJM-St-Etienne, CNRS UMR 5516,
  147. F-42000, Saint-Etienne, France}} \footnotetext{\textit{$^{b}$~ITMO
  148. University, Kronverksiy pr. 49, St. Petersburg, Russia}}
  149. % Please use \dag to cite the ESI in the main text of the article.
  150. % If you article does not have ESI please remove the the \dag symbol
  151. % from the title and the footnotetext below.
  152. % \footnotetext{\dag~Electronic Supplementary Information (ESI)
  153. % available: [details of any supplementary information available
  154. % should be included here]. See DOI:10.1039/b000000x/} %additional
  155. % addresses can be cited as above using the lower-case letters, c, d,
  156. % e... If all authors are from the same address, no letter is required
  157. % \footnotetext{\ddag~Additional footnotes to the title and authors can
  158. % be included \emph{e.g.}\ `Present address:' or `These authors
  159. % contributed equally to this work' as above using the symbols: \ddag,
  160. % \textsection, and \P. Please place the appropriate symbol next to the
  161. % author's name and include a \texttt{\textbackslash footnotetext} entry
  162. % in the the correct place in the list.}
  163. %%%END OF FOOTNOTES%%%
  164. %%%MAIN TEXT%%%%
  165. \section{Introduction}
  166. All-dielectric nonlinear nanophotonics based on high refractive index
  167. dielectric has become prospective paradigm in modern optics, owing to
  168. recent advances in harmonics generation~\cite{shcherbakov2014enhanced,
  169. yang2015nonlinear, makarov2016self, shorokhov2016multifold,
  170. makarov2017efficient} and ultrafast all-optical
  171. modulation~\cite{iyer2015reconfigurable, makarov2015tuning,
  172. shcherbakov2015ultrafast, yang2015nonlinear, baranov2016nonlinear,
  173. baranov2016tuning, shcherbakov2017ultrafast}. In fact,
  174. all-dielectric nanoantennas and metasurfaces possess much smaller
  175. parasitic Joule losses at high intensities as compared with their
  176. plasmonic counterparts, whereas their nonlinear properties are
  177. comparable. More importantly, the unique properties of the nonlinear
  178. all-dielectric nanodevices are due to existing of both electric and
  179. magnetic optical resonances in visible and near IR
  180. ranges~\cite{kuznetsov2016optically}. For instance, even slight
  181. variation of dielectric permittivity around optical resonances leads
  182. to significant changes of optical properties (transmittance or
  183. reflectance) of all-dielectric nanoantennas~\cite{makarov2015tuning,
  184. baranov2016nonlinear, baranov2016tuning} and
  185. metasurfaces~\cite{iyer2015reconfigurable, shcherbakov2015ultrafast,
  186. yang2015nonlinear, shcherbakov2017ultrafast, makarov2017light}.
  187. In these works on all-dielectric nonlinear nanostructures, the
  188. building blocks (nanoparticles) were considered as objects with
  189. dielectric permittivity \textit{homogeneously} distributed over
  190. nanoparticle (NP). Therefore, in order to manipulate the propagation
  191. angle of the transmitted light it was proposed to use complicated
  192. nanostructures with reduced symmetry~\cite{albella2015switchable,
  193. baranov2016tuning, shibanuma2016unidirectional}.
  194. \begin{figure}[t] \centering
  195. \includegraphics[width=0.75\linewidth]{Concept.pdf}
  196. \caption{Schematic illustration of electron-hole plasma 2D and 1D
  197. distributions in silicon nanoparticle around a magnetic resonance.}
  198. \label{fgr:concept}
  199. \end{figure}
  200. Recently, plasma explosion imaging technique has been used to
  201. observe electron-hole plasma (EHP), produced by femtosecond lasers,
  202. inside NPs~\cite{Hickstein2014}. Particularly, a strongly
  203. localized EHP in the front side\footnote{The incident wave propagates
  204. in positive direction of $z$ axis. For the NP with
  205. geometric center located at $z=0$ front side corresponds to the
  206. volume $z>0$ and back side for $z<0$} of NaCl nanocrystals of
  207. $R = 100$~nm was revealed. The forward ejection of ions in this case
  208. was attributed to a nanolensing effect inside the NP and the
  209. intensity enhancement as low as $10\%$ on the far side of the
  210. NP. Much stronger enhancements can be achieved near electric
  211. and magnetic dipole resonances excited in single semiconductor
  212. NPs, such as silicon (Si), germanium (Ge) etc.
  213. In this Letter, we show that ultra-short laser-based EHP
  214. photo-excitation in a spherical semiconductor (e.g., silicon) NP leads
  215. to a strongly inhomogeneous carrier distribution. To reveal and study
  216. this effect, we perform a full-wave numerical simulation. We consider
  217. an intense femtosecond (\textit{fs}) laser pulse to interact with a
  218. silicon NP supporting Mie resonances and two-photon free carrier
  219. generation. In particular, we couple finite-difference time-domain
  220. (FDTD) method used to solve three-dimensional Maxwell equations with
  221. kinetic equations describing nonlinear EHP generation.
  222. Three-dimensional transient variation of the material dielectric
  223. permittivity is calculated for NPs of several sizes. The obtained
  224. results propose a novel strategy to create complicated non-symmetrical
  225. nanostructures by using single photo-excited spherical silicon
  226. NPs. Moreover, we show that a dense EHP can be generated at deeply
  227. subwavelength scale ($< \lambda / 10$) supporting the formation of
  228. small metalized parts inside the NP. In fact, such effects transform
  229. an all-dielectric NP to a hybrid metall-dielectric one strongly
  230. extending functionality of the ultrafast optical nanoantennas.
  231. %Plan:
  232. %\begin{itemize}
  233. %\item Fig.3: Temporal evolution of EHP in NP with fixed diameter (at
  234. %MD) at different intensities, in order to show possible regimes of
  235. %plasma-patterning of NP volume. It would be nice, if we will show
  236. %power patterns decencies on intensity for side probe pulse to show beam steering due to symmetry breaking.
  237. %\item Fig.4: (a) Dependence on pulse duration is also interesting. We
  238. %have to show at which duration the asymmetry factor is saturated. (b)
  239. %2D map of asymmetry factor in false colors, where x-axis and y-axis correspond to intensity and NP diameter.
  240. %\end{itemize} %Additionally, if you will manage to calculate
  241. %evolution of scattering power pattern and show considerable effect of
  242. % beam steering, we can try Nanoscale or LPR, because the novelty will
  243. % be very high.
  244. \section{Modeling details}
  245. We focus attention on silicon because this material is promising for
  246. the implementation of numerous nonlinear photonic devices. This
  247. advantage is based on a broad range of optical nonlinearities, strong
  248. two-photon absorption, as well as a possibility of the photo-induced
  249. EHP excitation~\cite{leuthold2010nonlinear}. Furthermore, silicon
  250. nanoantennas demonstrate a sufficiently high damage threshold due to
  251. the large melting temperature ($\approx 1690$~K), whereas its nonlinear
  252. optical properties have been extensively studied during last
  253. decays~\cite{Van1987, Sokolowski2000, leuthold2010nonlinear}. High
  254. silicon melting point typically preserves structures formed from this
  255. material up to the EHP densities on the order of the critical value
  256. $N_{cr} \approx 5\cdot{10}^{21}$~cm$^{-3}$ \cite{Korfiatis2007}. At
  257. the critical density and above, silicon acquires metallic properties
  258. ($Re(\epsilon) < 0$) and contributes to the EHP reconfiguration during
  259. ultrashort laser irradiation.
  260. The process of three-dimensional photo-generation of the EHP in
  261. silicon NPs has not been modeled before in time-domain. Therefore,
  262. herein we propose a model considering ultrashort laser interactions
  263. with a resonant silicon sphere, where the EHP is generated via one-
  264. and two-photon absorption processes. Importantly, we also consider
  265. nonlinear feedback of the material by taking into account the
  266. intraband light absorption on the generated free carriers. To simplify
  267. our model, we neglect free carrier diffusion due to the considered
  268. short time scales. In fact, the aim of the present work is to study
  269. the EHP dynamics \textit{during} ultra-short (\textit{fs}) laser
  270. interaction with the NP. The created electron-hole modifies both
  271. laser-particle interaction and, hence, the following particle
  272. evolution. However, the plasma then will recombine at picosecond time
  273. scale.
  274. \subsection{Light propagation}
  275. Ultra-short laser interaction and light propagation inside the silicon
  276. NP are modeled by solving the system of three-dimensional Maxwell's equations
  277. written in the following way
  278. \begin{align} \begin{cases} \label{Maxwell}$$
  279. \displaystyle{\frac{\partial{\vec{E}}}{\partial{t}}=\frac{\nabla\times\vec{H}}{\epsilon_0\epsilon}-\frac{1}{\epsilon_0\epsilon}(\vec{J}_p+\vec{J}_{Kerr})} \\
  280. \displaystyle{\frac{\partial{\vec{H}}}{\partial{t}}=-\frac{\nabla\times\vec{E}}{\mu_0}},
  281. $$ \end{cases}
  282. \end{align}
  283. where $\vec{E}$ is the electric field, $\vec{H}$ is the magnetizing
  284. field, $\epsilon_0$ is the free space permittivity, $\mu_0$ is the
  285. permeability of free space, $\epsilon = n^2 = 3.681^2$ is the
  286. permittivity of non-excited silicon at $800$~nm wavelength
  287. \cite{Green1995}, $\vec{J}_p$ and $\vec{J}_{Kerr}$ are the nonlinear
  288. currents, which include the contribution due to Kerr effect
  289. $\vec{J}_{Kerr} =
  290. \epsilon_0\epsilon_\infty\chi_3\frac{\partial\left(\left|\vec{E}\right|^2\vec{E}\right)}{\partial{t}}$,
  291. where $\chi_3 =4\cdot{10}^{-20}$ m$^2$/V$^2$ for laser wavelength
  292. $\lambda = 800$~nm \cite{Bristow2007}, and heating of the conduction
  293. band, described by the differential equation derived from the Drude
  294. model
  295. \begin{equation} \label{Drude}
  296. \displaystyle{\frac{\partial{\vec{J_p}}}{\partial{t}} = -
  297. \nu_e\vec{J_p} + \frac{e^2N_e(t)}{m_e^*}\vec{E}},
  298. \end{equation}
  299. where $e$ is the elementary charge, $m_e^* = 0.18m_e$ is the reduced
  300. electron-hole mass \cite{Sokolowski2000}, $N_e(t)$ is the
  301. time-dependent free carrier density and $\nu_e = 10^{15}$~s$^{-1}$ is
  302. the electron collision frequency \cite{Sokolowski2000}. Silicon
  303. NP is surrounded by vacuum, where the light propagation is
  304. calculated by Maxwell's equations with $\vec{J} = 0$ and
  305. $\epsilon = 1$. The system of Maxwell's equations coupled with
  306. electron density equation is solved by the finite-difference numerical
  307. method \cite{Rudenko2016}, based on the finite-difference time-domain
  308. (FDTD) \cite{Yee1966} and auxiliary-differential methods for
  309. dispersive media \cite{Taflove1995}. At the edges of the grid, we
  310. apply the absorbing boundary conditions related to convolutional
  311. perfectly matched layers (CPML) to avoid nonphysical reflections
  312. \cite{Roden2000}. The initial electric field is introduced as a
  313. Gaussian slightly focused beam as follows
  314. \begin{align}
  315. \begin{aligned}
  316. \label{Gaussian}
  317. {E_x}(t, r, z) = \frac{w_0}{w(z)}{exp}\left(i\omega{t} - \frac{r^2}{{w(z)}^2} - ikz - ik\frac{r^2}{2R(z)} + i\varsigma(z)\right)\\
  318. \times\;{exp}\left(-\frac{4\ln{2}(t-t_0)^2}{\theta^2}\right),
  319. \end{aligned}
  320. \end{align}
  321. where $\theta = 50$~\textit{fs} is the temporal pulse width at the half maximum (FWHM),
  322. $t_0$ is a time delay, $w_0 = 3{\mu}m$ is the waist beam,
  323. $w(z) = {w_0}\sqrt{1+(\frac{z}{z_R})^2}$ is the Gaussian's beam spot
  324. size, $\omega = 2{\pi}c/{\lambda}$ is the angular frequency,
  325. $\lambda = 800$~nm is the laser wavelength in air, $c$ is the speed of
  326. light, ${z_R} = \frac{\pi{{w_0}^2}n_0}{\lambda}$ is the Rayleigh
  327. length, $r = \sqrt{x^2 + y^2}$ is the radial distance from the beam's
  328. waist, $R_z = z\left(1+(\frac{z_R}{z})^2\right)$ is the radius of
  329. curvature of the wavelength comprising the beam, and
  330. $\varsigma(z) = {\arctan}(\frac{z}{z_R}) $ is the Gouy phase shift.
  331. \subsection{Material ionization}
  332. To account for the material ionization that is induced by a
  333. sufficiently intense laser field inside the particle, we couple
  334. Maxwell's equations with the kinetic equation for the electron-hole
  335. plasma as described below.
  336. The time-dependent conduction-band carrier density evolution is
  337. described by a rate equation that was proposed by van Driel
  338. \cite{Van1987}. This equation takes into account such processes as
  339. photoionization, avalanche ionization and Auger recombination, and is
  340. written as
  341. \begin{equation} \label{Dens}
  342. \displaystyle{\frac{\partial{N_e}}{\partial t} =
  343. \frac{N_a-N_e}{N_a}\left(\frac{\sigma_1I}{\hbar\omega} +
  344. \frac{\sigma_2I^2}{2\hbar\omega}\right) + \alpha{I}N _e -
  345. \frac{C\cdot{N_e}^3}{C\tau_{rec}N_e^2+1},} \end{equation} where
  346. $I=\frac{n}{2}\sqrt{\frac{\epsilon_0}{\mu_0}}\left|\vec{E}\right|^2$
  347. is the intensity, $\sigma_1 = 1.021\cdot{10}^3$~cm$^{-1}$ and
  348. $\sigma_2 = 0.1\cdot{10}^{-7}$~cm/W are the one-photon and two-photon
  349. interband cross-sections \cite{Choi2002, Bristow2007, Derrien2013},
  350. $N_a = 5\cdot{10}^{22}$~cm$^{-3}$ is the saturation particle density
  351. \cite{Derrien2013}, $C = 3.8\cdot{10}^{-31}$~cm$^6$/s is the Auger
  352. recombination rate \cite{Van1987}, $\tau_{rec} = 6\cdot{10}^{-12}$~s is
  353. the minimum Auger recombination time \cite{Yoffa1980}, and
  354. $\alpha = 21.2$~cm$^2$/J is the avalanche ionization coefficient
  355. \cite{Pronko1998} at the wavelength $800$~nm in air. As we have noted,
  356. free carrier diffusion is neglected during and shortly after the laser
  357. excitation \cite{Van1987, Sokolowski2000}. In particular, from the
  358. Einstein formula $D = k_B T_e \tau/m^* \approx (1\div2)\cdot{10}^{-3}$ m$^2$/s
  359. ($k_B$ is the Boltzmann constant, $T_e$ is the electron temperature,
  360. $\tau=1$~\textit{fs} is the collision time, $m^* = 0.18 m_e$ is the effective
  361. mass), where $T_e \approx 2*{10}^4$ K for $N_e$ close to $N_{cr}$ \cite{Ramer2014}. It
  362. means that during the pulse duration ($\approx 50$~\textit{fs}) the diffusion
  363. length will be around 5--10~nm for $N_e$ close to $N_{cr}$.
  364. \begin{figure}[ht!]
  365. \centering
  366. \includegraphics[width=0.495\textwidth]{mie-fdtd-3}
  367. \caption{\label{mie-fdtd} (a, b) First four Lorentz-Mie coefficients
  368. ($a_1$, $a_2$, $b_1$, $b_2$) and factors of asymmetry $G_I$,
  369. $G_{I^2}$ according to Mie theory at fixed wavelength $800$~nm. (c,
  370. d) Squared intensity distribution calculated by Mie theory and (e,
  371. f) EHP distribution for low free carrier densities
  372. $N_e \approx 10^{20}$~cm$^{-3}$ by Maxwell's equations
  373. (\ref{Maxwell}, \ref{Drude}) coupled with EHP density equation
  374. (\ref{Dens}). (c-f) Incident light propagates from the left to the
  375. right along $Z$ axis, electric field polarization $\vec{E}$ is along
  376. $X$ axis.}
  377. \end{figure}
  378. The changes of the real and imaginary parts of the permittivity
  379. associated with the time-dependent free carrier response
  380. \cite{Sokolowski2000} can be derived from equations (\ref{Maxwell},
  381. \ref{Drude}) and are written as follows
  382. \begin{align} \begin{cases} \label{Index} $$
  383. \displaystyle{Re(\epsilon^\ast) = \epsilon -\frac{{e^2}N_e}{\epsilon_0m_e^*(\omega^2+{\nu_e}^2)}} \\
  384. \displaystyle{Im(\epsilon^\ast) = \frac{{e^2}N_e\nu_e}{\epsilon_0m_e^*\omega(\omega^2+{\nu_e}^2)}.}
  385. $$ \end{cases} \end{align}
  386. \subsection{Mie calculations}
  387. A steady-state interaction of a plain electromagnetic wave with a
  388. spherical particle has a well-known analytical solution described by a
  389. Mie theory~\cite{Bohren1983}. It is only valid in the absence of
  390. nonlinear optical response, thus we can compare it against
  391. above-mentioned FDTD-EHP model only for small plasma densities, where
  392. we can neglect EHP impact to the refractive index. Non-stationary
  393. nature of a femtosecond pulse increase the complexity of the
  394. analysis. A detailed discussion on the relation between Mie theory and
  395. FDTD-EHP model will be provided in the next section.
  396. We used Scattnlay program to evaluate calculations of Mie coefficients
  397. and near-field distribution~\cite{Ladutenko2017}. This program is
  398. available online at GitHub~\cite{Scattnlay-web} under open source
  399. license.
  400. \section{Results and discussion}
  401. \begin{figure*}[p]
  402. \centering
  403. \includegraphics[width=145mm]{time-evolution-I-no-NP.pdf}
  404. \caption{\label{time-evolution} Temporal EHP (a, c, e) and asymmetry factor
  405. $G_{N_e}$ (b, d, f) evolution for different Si nanoparticle radii of
  406. (a, b) $R = 75$~nm, (c, d) $R = 100$~nm, and (e, f) $R = 115$~nm. Pulse
  407. duration $50$~\textit{fs} (FWHM). Wavelength $800$~nm in air. (b,
  408. d, f) Different stages of EHP evolution shown in Fig.~\ref{plasma-grid}
  409. are indicated. The temporal evolution of Gaussian beam intensity is
  410. also shown. Peak laser fluence is fixed to be $0.125$~J/cm$^2$.}
  411. \vspace*{\floatsep}
  412. \centering
  413. \includegraphics[width=150mm]{plasma-grid.pdf}
  414. \caption{\label{plasma-grid} EHP density snapshots inside Si nanoparticle of
  415. radii $R = 75$~nm (a-d), $R = 100$~nm (e-h) and $R = 115$~nm (i-l)
  416. taken at different times and conditions of excitation (stages
  417. $1-4$: (1) first optical cycle, (2) extremum at few optical cycles,
  418. (3) Mie theory, (4) nonlinear effects). $\Delta{Re(\epsilon)}$
  419. indicates the real part change of the dielectric function defined
  420. by Equation (\ref{Index}). Pulse duration $50$~\textit{fs}
  421. (FWHM). Wavelength $800$~nm in air. Peak laser fluence is fixed to
  422. be $0.125$~J/cm$^2$.}
  423. \end{figure*}
  424. %\subsection{Effect of the irradiation intensity on EHP generation}
  425. We start with a pure electromagnetic problem without EHP
  426. generation. We plot in Fig.~\ref{mie-fdtd}(a) Mie coefficients of a
  427. Si NP as a function of its size for a fixed laser wavelength
  428. $\lambda = 800$~nm. For the NP sizes under consideration most of
  429. contribution to the electromagnetic response originates from electric
  430. and magnetic dipole (ED and MD), while for sizes near
  431. $R \approx 150$~nm a magnetic quadrupole (MQ) response turns to be
  432. the main one. The superposition of multipoles defines the
  433. distribution of electric field inside of the NP. We introduce $G_I$
  434. factor of asymmetry, corresponding to difference between the volume
  435. integral of intensity in the front side of the NP to that in the back
  436. side normalized to their sum:
  437. $G_I = (I^{front}-I^{back})/(I^{front}+I^{back})$, where
  438. $I^{front}=\int_{(z>0)}|E|^2d{\mathrm{v}}$ and
  439. $I^{back}=\int_{(z<0)} |E|^2d{\mathrm{v}}$ are expressed via
  440. amplitude of the electric field $|E|$. The factor $G_{I^2}$ was
  441. determined in a similar way by using volume integrals of squared
  442. intensity to predict EHP asymmetry due to two-photon absorption.
  443. Fig.~\ref{mie-fdtd}(b) shows $G$ factors as a function of the NP
  444. size. For the NPs of sizes below the first magnetic dipole resonance,
  445. the intensity is enhanced in the front side as in
  446. Fig.~\ref{mie-fdtd}(c) and $G_I > 0$. The behavior changes near the
  447. size resonance value, corresponding to $R \approx 105$~nm. In
  448. contrast, for larger sizes, the intensity is enhanced in the back
  449. side of the NP as demonstrated in Fig.~\ref{mie-fdtd}(d). In fact,
  450. very similar EHP distributions can be obtained by applying Maxwell's
  451. equations coupled with the rate equation for relatively weak
  452. excitation with EHP concentration of $N_e \approx
  453. 10^{20}$~cm$^{-3}$. The optical properties do not change considerably
  454. due to the excitation according to (\ref{Index}). Therefore, the
  455. excitation processes follow the intensity distribution. However, such
  456. coincidence was achieved under quasi-stationary conditions, after the
  457. electric field made enough oscillations inside the Si NP, transient
  458. analysis reveal much more details.
  459. To achieve a qualitative description for evolution of the EHP
  460. distribution during the \textit{fs} pulse, we introduced another
  461. asymmetry factor
  462. $G_{N_e} = (N_e^{front}-N_e^{back})/(N_e^{front}+N_e^{back})$
  463. indicating the relationship between the average EHP densities in the
  464. front and in the back halfs of the NP. This way, $G_{N_e} = 0$
  465. corresponds to the quasi-homogeneous case and the assumption of the
  466. NP homogeneous EHP distribution can be made to investigate the
  467. optical response of the excited Si NP. When $G_{N_e}$ significantly
  468. differs from $0$, this assumption, however, could not be
  469. justified. In what follows, we discuss the results of the numerical
  470. modeling of the temporal evolution of the asymmetry factor $G_{N_e}$
  471. in Fig.~\ref{time-evolution} revealing the EHP evolution stages during pulse
  472. duration shown in Fig.~\ref{plasma-grid}.
  473. % Fig. \ref{Mie} demonstrates the temporal evolution of the EHP
  474. % generated inside the silicon NP of $R \approx 105$~nm. Here,
  475. % irradiation by high-intensity, $I\approx $ from XXX to YYY (???),
  476. % ultrashort laser Gaussian pulse is considered. Snapshots of free
  477. % carrier density taken at different times correspond to different
  478. % total amount of the deposited energy (different laser intensities).
  479. %To better analyze the degree of inhomogeneity, we introduce the EHP
  480. % asymmetry parameter, $G$, which is defined as a relation between the
  481. % average electron density generated in the front side of the
  482. % NP and the average electron density in the back side, as
  483. % shown in Fig. \ref{plasma-grid}. During the femtosecond pulse interaction,
  484. % this parameter significantly varies.
  485. To describe all the stages of powerful enough light interaction with
  486. Si NP, we present the calculation results obtained by using Maxwell's
  487. equations coupled with electron kinetics equations for different
  488. radii for resonant and non-resonant conditions. In this case, the
  489. geometry of the EHP distribution can strongly deviate from the
  490. intensity distribution given by Mie theory. Two main reasons cause
  491. the deviation: (i) non-stationarity of the energy deposition and (ii)
  492. nonlinear effects, taking place due to transient optical changes in
  493. Si. The non-stationary intensity deposition results in different time
  494. delays for exciting electric and magnetic resonances inside Si NP
  495. because of different quality factors $Q$ of the resonances. In
  496. particular, magnetic dipole resonance (\textit{b1}) has $Q \approx
  497. 8$, whereas electric one (\textit{a1}) has $Q \approx 4$. The larger
  498. particle supporting magnetic quadrupole resonance (\textit{b2})
  499. demonstrates \textit{Q} $\approx 40$. As soon as the electromagnetic
  500. wave period at $\lambda$~=~800~nm is 2.6~\textit{fs}, one needs about
  501. 10~\textit{fs} to pump the electric dipole, 20~\textit{fs} for the
  502. magnetic dipole, and about 100~\textit{fs} for the magnetic
  503. quadrupole. According to these considerations, the first optical
  504. cycles taking place on few-femtosecond scale result in the excitation
  505. of the low-\textit{Q} electric dipole resonance independently on the
  506. exact size of NPs and with the EHP concentration mostly on the front
  507. side of the NPs. We address to this phenomena as \textit{'Stage 1'},
  508. as shown in Figs.~\ref{plasma-grid} and~\ref{plasma-grid}. The first stage at the
  509. first optical cycle demonstrates the dominant electric dipole
  510. resonance effect on the intensity/EHP density distribution inside the
  511. NPs in Fig.~\ref{plasma-grid}(a,e,j) and~\ref{time-evolution}. The larger the NPs size
  512. is, the higher the NP asymmetry $G_{N_e}$ is achieved.
  513. \textit{'Stage 2'} corresponds to further electric field oscillations
  514. ($t \approx 2\div15$) leading to the unstationery EHP evolution
  515. with a maximum of the EHP distribution in the front side of the Si NP
  516. owing to the starting excitation of MD and MQ resonances that require more
  517. time to be excited. At this stage, the density of EHP ($N_e < 10^{20}$~cm$^2$)
  518. is still not high enough to significantly affect the optical properties
  519. of the NP.
  520. A number of optical cycles ($>$10 or $t>$25~\textit{fs}) is necessary
  521. to achieve the stationary intensity pattern corresponding to the
  522. Mie-based intensity distribution at the \textit{'Stage $3$'} (see
  523. Fig.~\ref{time-evolution}). The EHP density is still relatively small to affect
  524. the EHP evolution or for diffusion, but is already high enough to
  525. change the local optical properties. Below the magnetic dipole
  526. resonance $R \approx 100$~nm, the EHP is mostly localized in the
  527. front side of the NP as shown in Fig.~\ref{plasma-grid}(c). The highest
  528. stationary asymmetry factor $G_{N_e} \approx 0.5\div0.6$ is achieved
  529. in this case. At the magnetic dipole resonance conditions, the EHP
  530. distribution has a toroidal shape and is much closer to the
  531. homogeneous distribution. In contrast, above the magnetic dipole
  532. resonant size for $R = 115$~nm, and the $G_{N_e} < 0$ due to the fact
  533. that EHP is dominantly localized in the back side of the NP.
  534. For the higher excitation conditions, the optical properties of
  535. silicon change significantly according to the equations
  536. (\ref{Index}). As a result, the non-resonant electric dipole
  537. contributes to the forward shifting of EHP density
  538. maximum. Therefore, EHP is localized in the front part of the NP,
  539. influencing the asymmetry factor $G_{N_e}$ in
  540. Fig.~\ref{time-evolution}. Approximately at the pulse peak, the critical
  541. electron density $N_{cr} = 5\cdot{10}^{21}$~cm$^{-3}$ for silicon,
  542. which corresponds to the transition to quasi-metallic state
  543. $Re(\epsilon) \approx 0$ and to the electron plasma resonance, is
  544. overcome. Further irradiation leads to a decrease in the asymmetry
  545. parameter down to $G_{N_e} = 0$ for higher EHP densities, as one can
  546. observe in Fig.~\ref{plasma-grid}(d, h, l).
  547. As the EHP acquires quasi-metallic properties at stronger excitation
  548. $N_e > 5\cdot{10}^{21}$~cm$^{-3}$, the EHP distribution evolves
  549. inside NPs because of the photoionization and avalanche ionization
  550. induced transient optical response and the effect of newly formed
  551. EHP. This way, the distribution becomes more homogeneous and the
  552. effect is likely to be enhanced by electron diffusion inside Si
  553. NPs. We refer to these nonlinear phenomena as \textit{'Stage~$4$'}.
  554. It is worth noting that it is possible to achieve a formation of
  555. deeply subwavelength EHP regions due to high field localization. The
  556. smallest EHP localization and the larger asymmetry factor are
  557. achieved below the magnetic dipole resonant conditions for $R < 100$~nm.
  558. Thus, the EHP distribution in Fig.~\ref{plasma-grid}(c) is optimal for
  559. symmetry breaking in Si NP, as it results in the larger asymmetry
  560. factor $G_{N_e}$ and higher electron densities $N_e$. We stress here
  561. that such regime could be still safe for NP due to the very small
  562. volume where such high EHP density is formed.
  563. % \subsection{Effects of NP size and scattering efficiency
  564. % factor on scattering directions}
  565. % \begin{figure}[ht] \centering
  566. % \includegraphics[width=90mm]{time-evolution.png}
  567. % \caption{\label{time-evolution} a) Scattering efficiency factor $Q_{sca}$
  568. % dependence on the radius $R$ of non-excited silicon NP
  569. % calculated by Mie theory; b) Parameter of forward/backward scattering
  570. % dependence on the radius $R$ calculated by Mie theory for non-excited
  571. % silicon NP c) Optimization parameter $K$ dependence on the
  572. % average electron density $n_e^{front}$ in the front half of the
  573. % NP for indicated radii (1-7).}
  574. % \end{figure}
  575. % We have discussed the EHP kinetics for a silicon NP of a
  576. % fixed radius $R \approx 105$~nm. In what follows, we investigate the
  577. % influence of the NP size on the EHP patterns and temporal
  578. % evolution during ultrashort laser irradiation. A brief analysis of
  579. % the initial intensity distribution inside the NP given by
  580. % the classical Mie theory for homogeneous spherical particles
  581. % \cite{Mie1908} can be useful in this case. Fig. \ref{time-evolution}(a, b)
  582. % shows the scattering efficiency and the asymmetry parameter for
  583. % forward/backward scattering for non-excited silicon NPs of
  584. % different radii calculated by Mie theory \cite{Mie1908}. Scattering
  585. % efficiency dependence gives us the value of resonant sizes of
  586. % NPs, where the initial electric fields are significantly
  587. % enhanced and, therefore, we can expect that the following conditions
  588. % will result in a stronger electron density gradients. Additionally,
  589. % in the case of maximum forward or backward scattering, the initial
  590. % intensity distribution has the maximum of asymmetry. One can note,
  591. % that for $R \approx 100$~nm and $R \approx 150$~nm both criteria are
  592. % fulfilled: the intensity is enhanced $5-10$ times due to
  593. % near-resonance conditions and its distribution has a strong
  594. % asymmetry.
  595. % In what follows, we present the calculation results obtained by
  596. % using Maxwell's equations coupled with electron kinetics for
  597. % different extremum radii for resonant and non-resonant
  598. % conditions. One can note, that the maximum asymmetry factor of EHP
  599. % $G$ does not guarantee the optimal asymmetry of intensity
  600. % distribution, as the size of generated plasma and the value of the
  601. % electron density equally contribute to the change of the modified
  602. % NP optical response. For example, it is easier to localize
  603. % high electron densities inside smaller NPs, however, due
  604. % to the negligible size of the generated EHP with respect to laser
  605. % wavelength in media, the intensity distribution around the
  606. % NP will not change considerably. Therefore, we propose to
  607. % introduce the optimization factor
  608. % $K = \frac{n_e(G-1)R^2}{n_{cr}G{R_0^2}}$, where $R_0 = 100$~nm,
  609. % $n_{cr} = 5\cdot{10}^{21}~cm^{-3}$, and $G$ is asymmetry of EHP,
  610. % defined previously. The calculation results for different radii of
  611. % silicon NPs and electron densities are presented in
  612. % Fig. \ref{time-evolution}(c). One can see, that the maximum value are achieved
  613. % for the NPs, that satisfy both initial maximum forward
  614. % scattering and not far from the first resonant condition. For larger
  615. % NPs, lower values of EHP asymmetry factor are obtained, as
  616. % the electron density evolves not only from the intensity patterns in
  617. % the front side of the NP but also in the back side.
  618. %TODO:
  619. %Need to discuss agreement/differences between Mie and FDTD+rate. Anton ?!
  620. % To demonstrate the effect of symmetry breaking, we calculate the
  621. % intensity distribution around the NP for double-pulse
  622. % experiment. The first pulse of larger pulse energy and polarization
  623. % along $Ox$ generates asymmetric EHP inside silicon NP,
  624. % whereas the second pulse of lower pulse energy and polarization $Oz$
  625. % interacts with EHP after the first pulse is gone. The minimum
  626. % relaxation time of high electron density in silicon is
  627. % $\tau_{rec} = 6\cdot{10}^{-12}$~s \cite{Yoffa1980}, therefore, the
  628. % electron density will not have time to decrease significantly for
  629. % subpicosecond pulse separations. In our simulations, we use
  630. % $\delta{t} = 200\:f\!s$ pulse separation. The intensity
  631. % distributions near the silicon NP of $R = 95$~nm,
  632. % corresponding to maxima value of $K$ optimization factor, without
  633. % plasma and with generated plasma are shown in Fig. \ref{fig4}. The
  634. % intensity distribution is strongly asymmetric in the case of EHP
  635. % presence. One can note, that the excited NP is out of
  636. % quasi-resonant condition and the intensity enhancements in
  637. % Fig. \ref{fig4}(c) are weaker than in Fig. \ref{fig4}(b). Therefore,
  638. % the generated nanoplasma acts like a quasi-metallic nonconcentric
  639. % nanoshell inside the NP, providing a symmetry reduction
  640. % \cite{Wang2006}.
  641. % \begin{figure}[ht] \centering
  642. % \includegraphics[width=90mm]{fig4.png}
  643. % \caption{\label{fig4} a) Electron plasma distribution inside Si
  644. % NP $R \approx 95$~nm 50~\textit{fs} after the pulse peak;
  645. % (Kostya: Is it scattering field intensity snapshot $XXX\:f\!s$ after
  646. % the second pulse maxima passed the particle?) Intensity
  647. % distributions around and inside the NP b) without plasma,
  648. % c) with electron plasma inside.}
  649. % \end{figure}
  650. %\begin{figure} %\centering
  651. % \includegraphics[height=0.7\linewidth]{Si-flow-R140-XYZ-Eabs}
  652. % \caption{EHP distributions for nonres., MD, ED, and MQ NPs
  653. % at moderate photoexcitation. The aim is to show different possible
  654. % EHP patterns and how strong could be symmetry breaking.
  655. % \label{fgr:example}
  656. %\end{figure}
  657. %\subsection{Asymmetry analysis: effects of pulse duration, intensity
  658. % and size} It is important to optimize asymmetry by varying pulse
  659. % duration, intensity and size.
  660. \section{Conclusions} We have considered ultra-short and sufficiently
  661. intense light interactions with a single semiconductor nanoparticle
  662. under different irradiation conditions and for various particle
  663. sizes. As a result of the presented self-consistent calculations, we
  664. have obtained spatio-temporal EHP evolution inside the
  665. NPs and investigated the asymmetry of EHP distributions. % for different laser intensities. % and temporal pulse widths.
  666. %It has been demonstrated that the EHP generation strongly affects
  667. %NP scattering and, in particular, changes the preferable
  668. %scattering direction.
  669. Different pathways of EHP evolution from the front side to the back
  670. side have been revealed, depending on the NP sizes, and the
  671. origins of different behavior have been explained by the
  672. non-stationarity of the energy deposition and different quality
  673. resonant factors for exciting the electric and magnetic dipole
  674. resonances, intensity distribution by Mie theory and newly
  675. plasma-induced nonlinear effects. The effect of the strong broadband
  676. electric dipole resonance on the EHP asymmetric distribution during
  677. first optical cycles has been revealed for different size
  678. parameters. The higher EHP asymmetry is established for NPs
  679. of smaller sizes below the first magnetic dipole
  680. resonance. Essentially different EHP evolution and lower asymmetry is
  681. achieved for larger NPs due to the stationary intensity
  682. enhancement in the back side of the NP. The EHP densities
  683. above the critical value were shown to lead to the EHP distribution
  684. homogenization.
  685. % In particular, the scattering efficiency factor is used to define
  686. % the optimum NP size for preferential forward or backward
  687. % scattering. Furthermore, a parameter has been introduced to describe
  688. % the scattering asymmetry as a ratio of the EHP density in the front
  689. % side to that in the back side of the NP. This parameter
  690. % can be then used for two-dimensional scattering mapping, which is
  691. % particularly important in numerous photonics applications.
  692. The EHP asymmetry opens a wide range of applications in NP
  693. nanomashining/manipulation at nanoscale, in catalysis as well as numerous
  694. nano-bio-applications. The observed plasma-induced breaking symmetry
  695. can be also useful for beam steering, or for the enhanced second
  696. harmonics generation.
  697. \section{Acknowledgments}
  698. A. R. and T. E. I. gratefully acknowledge the CINES of CNRS for
  699. computer support. S. V. M. is thankful to ITMO Fellowship
  700. Program. This work was partially supported by Russian Foundation for
  701. Basic Researches (grants 17-03-00621, 17-02-00538, 16-29-05317).
  702. %%%END OF MAIN TEXT%%%
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