Tatiana 7 years ago
parent
commit
706b9deb96
1 changed files with 8 additions and 8 deletions
  1. 8 8
      main.tex

+ 8 - 8
main.tex

@@ -627,9 +627,9 @@ license.
  the resulting asymmetry becomes smaller. This way variations of asymmetry
  the resulting asymmetry becomes smaller. This way variations of asymmetry
  $G_{N_e}$ synced with the period of incident light decreases.
  $G_{N_e}$ synced with the period of incident light decreases.
 
 
- Higher excitation conditions are followed with large values of
+ Higher excitation conditions are followed by larger values of
  electric field amplitude, which lead to the appearance of high EHP
  electric field amplitude, which lead to the appearance of high EHP
- densities causing a significant change of optical properties of
+ densities causing a significant change in the optical properties of
  silicon according to the equations (\ref{Index}). From Mie theory, the initial (at the end of Stage~3) space pattern of
  silicon according to the equations (\ref{Index}). From Mie theory, the initial (at the end of Stage~3) space pattern of
  optical properties is non-homogeneous. When non-homogeneity of
  optical properties is non-homogeneous. When non-homogeneity of
  optical properties becomes strong enough it leads to the
  optical properties becomes strong enough it leads to the
@@ -644,11 +644,11 @@ license.
  quite different as we change the size of NP. For $R=75$~nm and
  quite different as we change the size of NP. For $R=75$~nm and
  $R=100$~nm we observe a front side asymmetry before Stage~4, however,
  $R=100$~nm we observe a front side asymmetry before Stage~4, however,
  the origin of it is quite different.  The $R=75$~nm NP is out of
  the origin of it is quite different.  The $R=75$~nm NP is out of
- resonance, moreover, Mie field pattern and the one which comes from
- Stage~1 are quite similar. As soon as EHP density becomes high enough
+ resonance, moreover, Mie field pattern and the one, which comes from
+ the Stage~1 are quite similar. As soon as EHP density becomes high enough
  to change optical properties, the NP is still out of resonance,
  to change optical properties, the NP is still out of resonance,
- however, presence of EHP increases absorption in accordance with
- (\ref{Index}). This effectively leads to a partial screening, and it
+ however, the presence of EHP increases absorption in agreement with
+ (\ref{Index}). This effect effectively leads to a partial screening, and it
  becomes harder for the incident wave to penetrate deeper into EHP. Finally,
  becomes harder for the incident wave to penetrate deeper into EHP. Finally,
  this finishes spilling the NP`s volume with plasma reducing the
  this finishes spilling the NP`s volume with plasma reducing the
  asymmetry, see Fig.~\ref{plasma-grid}(d).
  asymmetry, see Fig.~\ref{plasma-grid}(d).
@@ -664,8 +664,8 @@ license.
  The last NP with $R=115$~nm shows the most complex behavior during
  The last NP with $R=115$~nm shows the most complex behavior during
  the Stage~4. The superposition of Mie field pattern with the one from
  the Stage~4. The superposition of Mie field pattern with the one from
  Stage~1 results into the presence of two EHP spatial maxima, back and
  Stage~1 results into the presence of two EHP spatial maxima, back and
- front shifted. They serve to be a starting seed for EHP formation,
- the interplay between them forms a complex behavior of the asymmetry
+ front shifted. They serve as starting seeds for the EHP formation,
+ and an interplay between them forms a complex behavior of the asymmetry
  factor curve. Namely, the sign is changed from negative to positive
  factor curve. Namely, the sign is changed from negative to positive
  and back during the last stage. This numerical result can hardly be
  and back during the last stage. This numerical result can hardly be
  explained in a simple qualitative manner, it is too complex to
  explained in a simple qualitative manner, it is too complex to